Dr. Vivek M. Prabhu Profile

Dr. Vivek M. Prabhu

Chemical Engineer at National Institute of Standards and Technology

SPIE Involvement:

Author

Publications (24)

Proceedings Article | 1 April 2009 Paper

Characterization of the photoacid diffusion length

Shuhui Kang, Vivek Prabhu, Wen-li Wu, Eric Lin, Kwang-Woo Choi, Manish Chandhok, Todd Younkin, Wang Yueh

Proceedings Volume 7273, 72733U (2009) https://doi.org/10.1117/12.813555

KEYWORDS: Diffusion, Photoresist materials, Extreme ultraviolet lithography, Switches, Lithography, Line edge roughness, Photoresist developing, Polymers, Deep ultraviolet, Extreme ultraviolet

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Proceedings Article | 1 April 2009 Paper

Quantitative measurement of the molecular-mass distribution in calix[4]resorcinarene molecular glass resists by mass spectrometry

W. Wallace, K. Flynn, C. Guttman, D. VanderHart, V. Prabhu, A. De Silva, N. Felix, C. Ober

Proceedings Volume 7273, 72732L (2009) https://doi.org/10.1117/12.813680

KEYWORDS: Ions, Mass spectrometry, Calibration, Polymers, Molecular spectroscopy, Glasses, Molecules, Photoresist materials, Ionization, Molecular lasers

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Proceedings Article | 15 April 2008 Paper

A comparison of the reaction-diffusion kinetics between model-EUV polymer and molecular-glass photoresists

Shuhui Kang, Kristopher Lavery, Kwang-Woo Choi, Vivek Prabhu, Wen-Li Wu, Eric Lin, Anuja De Silva, Nelson Felix, Christopher Ober

Proceedings Volume 6923, 692317 (2008) https://doi.org/10.1117/12.773018

KEYWORDS: Diffusion, Polymers, Photoresist materials, Glasses, FT-IR spectroscopy, Switches, Temperature metrology, Solids, Image resolution, Extreme ultraviolet

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Proceedings Article | 15 April 2008 Paper

The effect of EUV molecular glass architecture on the bulk dispersion of a photo-acid generator

David VanderHart, Anuja De Silva, Nelson Felix, Vivek Prabhu, Christopher Ober

Proceedings Volume 6923, 69231M (2008) https://doi.org/10.1117/12.773048

KEYWORDS: Magnesium, Diffusion, Polarization, Crystals, Molecules, Glasses, Thermodynamics, Photoresist materials, Solids, Spherical lenses

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We have examined four molecular glasses (MGs) which are candidates for EUV photoresist formulations. These derivatized glasses, and their unprotected precursors, were investigated by both proton and ¹³C solid state NMR techniques in the bulk state as pure materials and as mixtures with 5 or 10 % by mass of the photoacid generator (PAG), triphenyl sulfonium perfluorobutanesulfonate. The ¹³C techniques gave information about crystallinity, purity, and the presence of the PAG. This paper characterizes the intimacy of mixing of the PAG and the MGs using proton spin diffusion methods. Phase separation of the PAG into PAG-rich larger domains was never seen; the PAG was always finely distributed. A maximum diameter for any PAG clustered into spherical domains was estimated to be 3.8 nm, which is too small to reflect thermodynamic incompatibility as the driving force during relatively slow removal of solvent. Hence, PAG blended samples are deduced to be thermodynamically compatible, with differential solubility in the preparation solvent the most likely candidate for producing the significant inhomogeneities in PAG concentration observed in a few samples. For one of the unprotected crystalline calix[4]resorcinarenes precursor materials, the solvent, N-methyl 2-pyrrolidinone (NMP) was used. The resulting solid was crystalline with a segregation of isomers, one of which formed a solid adduct with a 1:1 molecular ratio with NMP. Qualitatively, the strong NMP affinity for the calix[4]resorcinarenes is also evident in a) the immobility of the NMP, b) the fact that the ¹⁴N quadrupolar interaction changes when NMP goes from the crystalline, unprotected host to a glassy, protected host, and c) that NMP tends to remain as a significant residue. Only the underivatized materials display crystallinity implying that the mixing of the PAG with any derivatized MG is not restricted by crystallization, at least not before the post-exposure bake step. As a final note, very strong hydrogen bonds exist in three underivatized materials which is reduced or eliminated with partial protection with t-BOC.

Proceedings Article | 3 April 2008 Paper

Characterization of the latent image to developed image in model EUV photoresists

John Woodward, Kwang-Woo Choi, Vivek Prabhu, Shuhui Kang, Kristopher Lavery, Wen-li Wu, Michael Leeson, Anuja De Silva, Nelson Felix, Christopher Ober

Proceedings Volume 6923, 69232B (2008) https://doi.org/10.1117/12.773036

KEYWORDS: Line width roughness, Magnesium, Extreme ultraviolet lithography, Atomic force microscopy, Extreme ultraviolet, Photoresist materials, Image processing, Switches, Image quality, Photoresist developing

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Proceedings Article | 12 April 2007 Paper

Identifying materials limits of chemically amplified photoresists

Wen-li Wu, Vivek Prabhu, Eric Lin

Proceedings Volume 6519, 651902 (2007) https://doi.org/10.1117/12.720424

KEYWORDS: Photoresist materials, Line edge roughness, Image quality, Polymers, Diffusion, Photoresist developing, Surface roughness, Image processing, Interfaces, Reflectivity

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Proceedings Article | 12 April 2007 Paper

Effect of photo-acid generator concentration and developer strength on the patterning capabilities of a model EUV photoresist

Kwang-Woo Choi, Vivek Prabhu, Kristopher Lavery, Eric Lin, Wen-li Wu, John Woodward, Michael Leeson, Heidi Cao, Manish Chandhok, George Thompson

Proceedings Volume 6519, 651943 (2007) https://doi.org/10.1117/12.712407

KEYWORDS: Photoresist materials, Line width roughness, Extreme ultraviolet lithography, Photoresist developing, Extreme ultraviolet, Optical lithography, Scanning electron microscopy, Standards development, Systems modeling, Performance modeling

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Proceedings Article | 3 April 2007 Paper

FTIR measurements of compositional heterogeneities

Shuhui Kang, Bryan Vogt, Wen-li Wu, Vivek Prabhu, David VanderHart, Ashwin Rao, Eric Lin, Karen Turnquest

Proceedings Volume 6519, 651916 (2007) https://doi.org/10.1117/12.712659

KEYWORDS: Hydrogen, Optical spheres, FT-IR spectroscopy, Polymers, Photoresist materials, Solids, Line edge roughness, Data modeling, Spectroscopy, Polymer thin films

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Proceedings Article | 22 March 2007 Paper

Evaluation of the 3D compositional heterogeneity effect on line-edge-roughness

Shuhui Kang, Wen-Li Wu, Vivek Prabhu, Bryan Vogt, Eric Lin, Karen Turnquest

Proceedings Volume 6519, 65193V (2007) https://doi.org/10.1117/12.712682

KEYWORDS: Line edge roughness, Switches, Diffusion, Photoresist materials, Optical spheres, Polymers, 3D modeling, Computer simulations, Photoresist developing, Standards development

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Proceedings Article | 22 March 2007 Paper

Direct measurement of the in-situ developed latent image: the residual swelling fraction

Vivek Prabhu, Bryan Vogt, Shuhui Kang, Ashwin Rao, Eric Lin, Sushil Satija, Karen Turnquest

Proceedings Volume 6519, 651910 (2007) https://doi.org/10.1117/12.712311

KEYWORDS: Polymers, Reflectivity, Interfaces, Scattering, Photoresist materials, Photoresist developing, Silicon, X-rays, In situ metrology, Standards development

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Proceedings Article | 29 March 2006 Paper

Fundamentals of the reaction-diffusion process in model EUV photoresists

Kristopher Lavery, Kwang-Woo Choi, Bryan Vogt, Vivek Prabhu, Eric Lin, Wen-li Wu, Sushil Satija, Michael Leeson, Heidi Cao, George Thompson, Hai Deng, David Fryer

Proceedings Volume 6153, 615313 (2006) https://doi.org/10.1117/12.656831

KEYWORDS: Photoresist materials, Reflectivity, Interfaces, Diffusion, Polymers, Line width roughness, Process modeling, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography

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Proceedings Article | 29 March 2006 Paper

The deprotection reaction front profile in model 193 nm methacrylate-based chemically amplified photoresists

Bryan Vogt, Shuhui Kang, Vivek Prabhu, Ashwin Rao, Eric Lin, Sushil Satija, Karen Turnquest, Wen-li Wu

Proceedings Volume 6153, 615316 (2006) https://doi.org/10.1117/12.656464

KEYWORDS: FT-IR spectroscopy, Diffusion, Reflectivity, Line edge roughness, Photoresist materials, Image quality, Image processing, Standards development, Polymers, Scattering

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Proceedings Article | 29 March 2006 Paper

Copolymer fraction effect on acid catalyzed deprotection reaction kinetics in model 193 nm photoresists

Shuhui Kang, Vivek Prabhu, Bryan Vogt, Eric Lin, Wen-Li Wu, Karen Turnquest

Proceedings Volume 6153, 61533N (2006) https://doi.org/10.1117/12.656594

KEYWORDS: Polymers, Photoresist materials, Diffusion, FT-IR spectroscopy, Data modeling, Glasses, Ultraviolet radiation, Spectroscopy, Chemical reactions, Hydrogen

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Proceedings Article | 29 March 2006 Paper

Dissolution fundamentals of 193-nm methacrylate-based photoresists

Ashwin Rao, Shuhui Kang, Bryan Vogt, Vivek Prabhu, Eric Lin, Wen-Li Wu, Karen Turnquest, William Hinsberg

Proceedings Volume 6153, 615310 (2006) https://doi.org/10.1117/12.656540

KEYWORDS: Polymers, Photoresist materials, Quartz, Crystals, Photoresist developing, Lithography, Chemistry, Molecules, Standards development, Infrared spectroscopy

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Proceedings Article | 4 May 2005 Paper

Interfacial structure of photoresist thin films in developer solutions

Vivek Prabhu, Bryan Vogt, Wen-Li Wu, Jack Douglas, Eric Lin, Sushil Satija, Dario Goldfarb, Hiroshi Ito

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.598956

KEYWORDS: Polymers, Reflectivity, Interfaces, Ionization, Photoresist materials, Thin films, Photoresist developing, Standards development, Dielectrics, Liquids

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Proceedings Article | 4 May 2005 Paper

Water distribution within immersed polymer films

Bryan Vogt, Christopher Soles, Vivek Prabhu, Sushil Satija, Eric Lin, Wen-li Wu

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599746

KEYWORDS: Interfaces, Reflectivity, Silicon, Polymers, Scattering, Water, Head-mounted displays, Polymer thin films, Photoresist materials, Semiconducting wafers

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SPIE Journal Paper | 1 January 2005

Water immersion of model photoresists: interfacial influences on water concentration and surface morphology

Bryan Vogt, Christopher Soles, Chia-Ying Wang, Vivek Prabhu, Patricia McGuiggan, Jack Douglas, Eric Lin, Wen-Li Wu, Sushil Satija, Dario Goldfarb, Marie Angelopoulos

JM3, Vol. 4, Issue 01, 013003, (January 2005) https://doi.org/10.1117/12.10.1117/1.1861852

KEYWORDS: Interfaces, Polymers, Oxides, Head-mounted displays, Photoresist materials, Silicon, Liquids, Absorption, Polymer thin films, Silicon films

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Proceedings Article | 14 May 2004 Paper

Resolution limitations in chemically amplified photoresist systems

Gerard Schmid, Michael Stewart, Chia-Ying Wang, Bryan Vogt, Vivek Prabhu, Eric Lin, C. Willson

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536656

KEYWORDS: Diffusion, Photoresist materials, Polymers, Molecules, Scattering, Interfaces, Lithography, Distance measurement, Manufacturing, Chemically amplified resists

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Proceedings Article | 14 May 2004 Paper

Fundamentals of developer-resist interactions for line-edge roughness and critical dimension control in model 248-nm and 157-nm photoresists

Vivek Prabhu, Michael Wang, Erin Jablonski, Bryan Vogt, Eric Lin, Wen-Li Wu, Dario Goldfarb, Marie Angelopoulos, Hiroshi Ito

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535862

KEYWORDS: Reflectivity, Photoresist developing, Surface roughness, Atomic force microscopy, Polymers, Photoresist materials, Scattering, Critical dimension metrology, Semiconducting wafers, X-rays

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Proceedings Article | 14 May 2004 Paper

Surface and bulk chemistry of chemically amplified photoresists: segregation in thin films and environmental stability issues

Erin Jablonski, Vivek Prabhu, Sharadha Sambasivan, Daniel Fischer, Eric Lin, Dario Goldfarb, Marie Angelopoulos, Hiroshi Ito

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535703

KEYWORDS: Photoresist materials, Ultraviolet radiation, Chemistry, Polymers, Protactinium, Carbon, Thin films, Sensors, Polymer thin films, Semiconducting wafers

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Proceedings Article | 14 May 2004 Paper

Measurements of water distribution in thin lithographic films

Bryan Vogt, Christopher Soles, Vivek Prabhu, Ronald Jones, Wen-Li Wu, Eric Lin, Dario Goldfarb, Marie Angelopoulos

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535881

KEYWORDS: Reflectivity, Interfaces, Silicon, Photoresist materials, Polymers, Oxides, Scattering, Thin films, Head-mounted displays, Silicon films

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Proceedings Article | 12 June 2003 Paper

Polyelectrolyte effects in model photoresist developer solutions: roles of base concentration and added salts

Vivek Prabhu, Ronald Jones, Eric Lin, Christopher Soles, Wen-li Wu, Dario Goldfarb, Marie Angelopoulos

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485147

KEYWORDS: Polymers, Scattering, Photoresist materials, Photoresist developing, Ionization, Interfaces, Ions, Sodium, Standards development, Physics

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Proceedings Article | 12 June 2003 Paper

Polymer dynamics and diffusive properties in ultrathin photoresist films

Christopher Soles, Ronald Jones, Joseph Lenhart, Vivek Prabhu, Wen-li Wu, Eric Lin, Dario Goldfarb, Marie Angelopoulos

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485140

KEYWORDS: Diffusion, Polymers, Thin films, Scattering, Crystals, Polymer thin films, Lithography, Absorption, Photoresist materials, Quartz

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Proceedings Article | 12 June 2003 Paper

Deprotection volume characteristics and line-edge morphology in chemically amplified resists

Ronald Jones, Tengjiao Hu, Vivek Prabhu, Christopher Soles, Eric Lin, Wen-li Wu, Dario Goldfarb, Marie Angelopoulos, Brian Trinque, C. Grant Willson

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485146

KEYWORDS: Line edge roughness, Polymers, Scattering, Diffusion, Fractal analysis, Chemically amplified resists, Fuzzy logic, Photoresist materials, Molecules, Motion models

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Showing 5 of 24 publications

Conference Committee Involvement (5)

Advances in Resist Materials and Processing Technology XXVII

22 February 2010 | San Jose, California, United States

Advances in Resist Materials and Processing Technology XXVI

23 February 2009 | San Jose, California, United States

Advances in Resist Materials and Processing Technology XXV

25 February 2008 | San Jose, California, United States

Advances in Resist Materials and Processing Technology XXIV

26 February 2007 | San Jose, California, United States

Advances in Resist Materials and Processing Technology XXIII

20 February 2006 | San Jose, California, United States

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