Dr. Vladimir B. Fleurov Profile

Dr. Vladimir B. Fleurov

CS System Engineer at Cymer LLC

SPIE Involvement:

Author

Publications (19)

Proceedings Article | 1 April 2013 Paper

Paper

CO2/Sn LPP EUV sources for device development and HVM

David Brandt, Igor Fomenkov, Nigel Farrar, Bruno La Fontaine, David Myers, Daniel Brown, Alex Ershov, Richard Sandstrom, Georgiy Vaschenko, Norbert Böwering, Palash Das, Vladimir Fleurov, Kevin Zhang, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Silvia De Dea, Wayne Dunstan, Peter Baumgart, Toshi Ishihara, Rod Simmons, Robert Jacques, Robert Bergstedt, Peter Porshnev, Christopher Wittak, Robert Rafac, Jonathan Grava, Alexander Schafgans, Yezheng Tao, Kay Hoffmann, Tedsuja Ishikawa, David Evans, Spencer Rich

Proceedings Volume 8679, 86791G (2013) https://doi.org/10.1117/12.2011212

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Scanners, Carbon dioxide lasers, Mirrors, Tin, Pulsed laser operation, Plasma systems, Laser scanners

Read Abstract +

Proceedings Article | 23 March 2012 Paper

Paper

Laser produced plasma EUV sources for device development and HVM

David Brandt, Igor Fomenkov, Michael Lercel, Bruno La Fontaine, David Myers, Daniel Brown, Alex Ershov, Richard Sandstrom, Alexander Bykanov, Georgiy Vaschenko, Norbert Böwering, Palash Das, Vladimir Fleurov, Kevin Zhang, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Silvia De Dea, Wayne Dunstan, Peter Baumgart, Toshi Ishihara, Rod Simmons, Robert Jacques, Robert Bergstedt, Peter Porshnev, Christian Wittak, Michael Woolston, Robert Rafac, Jonathan Grava, Alexander Schafgans, Yezheng Tao

Proceedings Volume 8322, 83221I (2012) https://doi.org/10.1117/12.916521

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Scanners, Mirrors, Coating, Manufacturing, Tin, Semiconducting wafers, Laser scanners

Read Abstract +

Proceedings Article | 8 April 2011 Paper

Paper

Laser produced plasma light source for EUVL

Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Daniel Brown, Richard Sandstrom, Bruno La Fontaine, Alexander Bykanov, Georgiy Vaschenko, Oleh Khodykin, Norbert Böwering, Palash Das, Vladimir Fleurov, Kevin Zhang, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Silvia De Dea, Richard Hou, Wayne Dunstan, Peter Baumgart, Toshihiko Ishihara, Rod Simmons, Robert Jacques, Robert Bergstedt, David Brandt

Proceedings Volume 7969, 796933 (2011) https://doi.org/10.1117/12.882210

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Spectrometers, Light sources, Scanners, Optical filters, Reflectivity, Optical lithography, Laser applications

Read Abstract +

Proceedings Article | 7 April 2011 Paper

Paper

LPP source system development for HVM

David Brandt, Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Richard Sandstrom, Bruno La Fontaine, Michael Lercel, Alexander Bykanov, Norbert Böwering, Georgiy Vaschenko, Oleh Khodykin, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Palash Das, Vladimir Fleurov, Kevin Zhang, Daniel Golich, Silvia De Dea, Richard Hou, Wayne Dunstan, Christian Wittak, Peter Baumgart, Toshihiko Ishihara, Rod Simmons, Robert Jacques, Robert Bergstedt

Proceedings Volume 7969, 79691H (2011) https://doi.org/10.1117/12.882208

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Reflectivity, Plasma, Mirrors, Semiconducting wafers, Carbon dioxide lasers, Laser scanners, 3D scanning

Read Abstract +

Proceedings Article | 16 March 2009 Paper

Paper

Enabling high volume manufacturing of double patterning immersion lithography with the XLR 600ix ArF light source

Rostislav Rokitski, Vladimir Fleurov, Robert Bergstedt, Hong Ye, Robert Rafac, Robert Jacques, Fedor Trintchouk, Toshihiko Ishihara, Rajasekhar Rao, Theodore Cacouris, Daniel Brown, William Partlo

Proceedings Volume 7274, 72743O (2009) https://doi.org/10.1117/12.816049

KEYWORDS: Double patterning technology, Polarization, Laser stabilization, Light sources, Scanners, High volume manufacturing, Immersion lithography, Lithography, Deep ultraviolet, Modulation

Read Abstract +

Deep ultraviolet (DUV) lithography improvements have been focused on two paths: further increases in the effective numerical aperture (NA) beyond 1.3, and double patterning (DP). High-index solutions for increasing the effective NA have not gained significant momentum due to several technical factors, and have been eclipsed by an aggressive push to make DP a high-volume manufacturing solution. The challenge is to develop a cost-effective solution using a process that effectively doubles the lithography steps required for critical layers, while achieving a higher degree of overlay performance. As a result, the light source requirements for DP fall into 3 main categories: (a) higher power to enable higher throughput on the scanner, (b) lower operating costs to offset the increased number of process steps, and (c) high stability of optical parameters to support more stringent process requirements. The XLR 600i (6kHz, 90W @15mJ) was introduced last year to enable DP by leveraging the higher performance and lower operating costs of the ring architecture XLR 500i (6kHz, 60W @10mJ) platform currently used for 45nm immersion lithography in production around the world. In February 2009, the XLR 600ix was introduced as a 60/90W switchable product to provide flexibility in the transition to higher power requirements as scanner capabilities are enhanced. The XLR 600ix includes improved optics materials to meet reliability requirements while operating at higher internal fluences. In this paper we will illustrate the performance characteristics during extended testing. Examples of performance include polarization stability, divergence and pointing stability, which enable consistent pupil fill under extreme illumination conditions, as well as overall thermal stability which maintains constant beam performance under large changes in laser operating modes. Furthermore, the unique beam uniformity characteristics that the ring architecture generates result in lower peak energy densities that are comparable to those of a typical 60W excimer laser. In combination with the XLR's long pulse duration, this allows for long life scanner optics while operating at 15mJ.

Proceedings Article | 17 March 2008 Paper

Paper

XLR 600i: recirculating ring ArF light source for double patterning immersion lithography

Vladimir Fleurov, Slava Rokitski, Robert Bergstedt, Hong Ye, Kevin O’Brien, Robert Jacques, Fedor Trintchouk, Efrain Figueroa, Theodore Cacouris, Daniel Brown, William Partlo

Proceedings Volume 6924, 69241R (2008) https://doi.org/10.1117/12.776927

KEYWORDS: Double patterning technology, Light sources, Immersion lithography, Control systems, Scanners, Excimer lasers, Pulsed laser operation, Laser scanners, 3D scanning, Semiconducting wafers

Read Abstract +

Proceedings Article | 27 March 2007 Paper

Paper

XLR 500i: recirculating ring ArF light source for immersion lithography

D.J. Brown, P. O'Keeffe, V. Fleurov, R. Rokitski, R. Bergstedt, I. Fomenkov, K. O'Brien, N. Farrar, W. Partlo

Proceedings Volume 6520, 652020 (2007) https://doi.org/10.1117/12.712684

KEYWORDS: Light sources, Molybdenum, Laser stabilization, Optical amplifiers, Critical dimension metrology, Pulsed laser operation, Laser applications, Lithography, Immersion lithography, Oscillators

Read Abstract +

As Argon Fluoride (ArF) lithography moves into high volume production, ArF light sources need to meet performance requirements beyond the traditional drivers of power and bandwidth. The first key requirement is a continuous decrease in Cost of Ownership (CoO) where the industry requirement is for reduction in ArF CoO in line with the historical cost reduction demonstrated for Krypton Fluoride (KrF) light sources. A second requirement is improved light source performance stability. As CD control requirements shrink, following the ITRS roadmap, all process parameters which affect CD variation need tighter control. In the case of the light source, these include improved control of bandwidth, pulse energy stability and wavelength. In particular, CD sensitivity to exposure dose has become a serious challenge for device processing and improvements to laser pulse energy stability can contribute to significantly better dose control. To meet these performance challenges Cymer has designed a new dual chamber laser architecture. The Recirculating Ring design requires 10X less energy from the Master Oscillator (MO). This new configuration enables the MO chamber lifetime to reach that of the power amplifier chamber at around 30Bp. In addition, other optical modules in the system such as the line narrowing module experience lower light intensity, ensuring even longer optics lifetime. Furthermore, the Recirculating Ring configuration operates in much stronger saturation. MO energy instabilities are reduced by a factor of 9X when passed through the Ring. The output energy stability exhibits the characteristics of a fully saturated amplifier and pulse energy stability improvement of 1.5X is realized. This performance enables higher throughput scanner operation with enhanced dose control. The Recirculating Ring technology will be introduced on the XLR 500i, Cymer's fifth-generation dual chamber-based light source built on the production-proven XLA platform. This paper will describe the design details and performance characteristics of the new laser architecture.

Proceedings Article | 24 March 2006 Paper

Paper

High-power low cost drive laser for LPP source

Igor Fomenkov, Björn Hansson, Norbert Böwering, Alex Ershov, William Partlo, Vladimir Fleurov, Oleh Khodykin, Alexander Bykanov, Curtis Rettig, Jerzy Hoffman, Ernesto Vargas L., Juan Chavez, William Marx, David Brandt

Proceedings Volume 6151, 61513X (2006) https://doi.org/10.1117/12.655733

KEYWORDS: Gas lasers, Molybdenum, Carbon monoxide, Optical amplifiers, Laser applications, Neodymium lasers, Oscillators, Extreme ultraviolet, Excimer lasers, High power lasers

Read Abstract +

We report on the approach for a high-power high-beam-quality drive laser system that is used for a laser-produced plasma (LPP) EUV source. Cymer has conducted research on a number of solutions for a multi-kW drive laser system that satisfy high volume production requirements. Types of lasers to be presented include XeF at 351 nm and CO₂ at 10.6 micron. We report on a high efficiency XeF amplifier with a 3rd harmonic Nd:YLF master oscillator operated in the 6 to 8 kHz range and a CO₂ laser system with Q-switched cavity dumped master oscillator and RF pumped fast axial flow amplifiers operated in the 10 to 100 kHz range. CO₂ laser short pulse gain and optical isolation techniques are reported. Optical performance data and design features of the drive laser system are discussed, as well as a path to achieve output power scaling to meet high volume manufacturing (HVM) requirements and beyond. Additionally, the electrical efficiency as a component of cost of operation is presented. Development of a drive laser with sufficient output power, high beam quality, and economical cost of operation is critical to the successful implementation of a laser-produced-plasma (LPP) EUV source for HVM applications. Cymer has conducted research on a number of solutions to this critical need. We report our progress on development of a high power system with two gas-discharge power amplifiers to produce high output power with high beam quality. We provide optical performance data and design features of the drive laser as well as a path to output power scaling to meet HVM requirements. Development of a drive laser for LPP EUV source is a challenging task. It requires multi-kW laser output power with short pulse duration and diffraction limited beam quality. In addition, this system needs to be very reliable and cost-efficient to satisfy industry requirements for high volume integrated circuit manufacturing. Feasibility studies of high power laser solutions that utilize proven laser technologies in high power optical gain modules and deliver required beam properties have been performed and are reported.

Proceedings Article | 6 May 2005 Paper

Paper

Development in gas-discharge drive lasers for LPP EUV sources

V. Fleurov, P. Oh, T. Steiger, I. Fomenkov, W. Partlo

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.601037

KEYWORDS: Molybdenum, Neodymium lasers, Energy efficiency, Extreme ultraviolet, Pulsed laser operation, Laser applications, Optical amplifiers, Laser systems engineering, Oscillators, High power lasers

Read Abstract +

Proceedings Article | 28 May 2004 Paper

Paper

Long-term reliable operation of a MOPA-based ArF light source for microlithography

Toshihiko Ishihara, Herve Besaucele, Cynthia Maley, Vladimir Fleurov, Patrick O'Keeffe, Mary Haviland, Richard Morton, Walter Gillespie, Timothy Dyer, Bryan Moosman, Robert Poole

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535614

KEYWORDS: Molybdenum, Oscillators, Optical lithography, Calibration, Electrodes, Manufacturing, Optics manufacturing, Light sources, Laser stabilization, Pulsed laser operation

Read Abstract +

Proceedings Article | 26 June 2003 Paper

Paper

Dual-chamber ultra line-narrowed excimer light source for 193-nm lithography

Vladimir Fleurov, Daniel Colon, Daniel Brown, Patrick O'Keeffe, Herve Besaucele, Alexander Ershov, Fedor Trintchouk, T. Ishihara, Paolo Zambon, R. Rafac, A. Lukashev

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485358

KEYWORDS: Molybdenum, Light sources, Excimers, Control systems, Lithography, Optical amplifiers, Acoustics, Optical lithography, Oscillators, Energy efficiency

Read Abstract +

Proceedings Article | 30 July 2002 Paper

Paper

Production-ready 4-kHz ArF laser for 193-nm lithography

Choonghoon Oh, Vladimir Fleurov, Thomas Hofmann, Thomas Duffey, F. Trintchouk, Patrick O'Keeffe, Peter Newman, Gerry Blumenstock

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474567

KEYWORDS: Lithography, Argon ion lasers, Control systems, Semiconductors, Semiconducting wafers, Optical lithography, Laser applications, Reliability, Yield improvement, Energy efficiency

Read Abstract +

Proceedings Article | 14 September 2001 Paper

Paper

Next-generation 193-nm laser for sub-100-nm lithography

Thomas Duffey, Gerry Blumenstock, Vladimir Fleurov, Xiaojiang Pan, Peter Newman, Holger Glatzel, Tom Watson, J. Erxmeyer, Ralf Kuschnereit, Bernhard Weigl

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435654

KEYWORDS: Lithography, Laser development, Laser applications, Optical lithography, Semiconducting wafers, Electrodes, Excimer lasers, Optical coatings, Light emitting diodes, Semiconductors

Read Abstract +

Proceedings Article | 5 July 2000 Paper

Paper

Performance of very high repetition rate ArF lasers

Jean-Marc Hueber, Herve Besaucele, Palash Das, Rick Eis, Alexander Ershov, Vladimir Fleurov, Dmitri Gaidarenko, Thomas Hofmann, Paul Melcher, William Partlo, Bernard Nikolaus, Scot Smith, Kyle Webb

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388979

KEYWORDS: Laser applications, Laser scanners, 3D scanning, Laser development, Pulsed laser operation, Semiconducting wafers, Laser optics, Laser stabilization, Fabry–Perot interferometers, Manufacturing

Read Abstract +

Proceedings Article | 5 July 2000 Paper

Paper

Comparison of ArF and KrF laser performance at 2 kHz for microlithography

Herve Besaucele, Palash Das, Thomas Duffey, Todd Embree, Alexander Ershov, Vladimir Fleurov, Steven Grove, Paul Melcher, Richard Ness, Gunasiri Padmabandu

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388986

KEYWORDS: Optical lithography, Sensors, 193nm lithography, Pulsed power, Laser stabilization, Control systems, Laser applications, Optics manufacturing, Fabry–Perot interferometers, Optical components

Read Abstract +

Proceedings Article | 10 October 1997 Paper

Paper

Real-time holography via DFWM in thin liquid crystal films and thin photorefractive materials

Vladimir Fleurov, Denise Brown-Anderson, Paul Carroll, Christopher Lawson

Proceedings Volume 3146, (1997) https://doi.org/10.1117/12.284159

KEYWORDS: Liquid crystals, Crystals, Nonlinear optics, Laser crystals, Holography, Laser beam diagnostics, Optical filters, Image resolution, Phase conjugation, Coherence (optics)

Read Abstract +

Proceedings Article | 18 December 1996 Paper

Paper

Continuously tunable single-mode twenty-atmosphere CO2 laser

Jerald Izatt, Wolfgang Schatz, Vladimir Fleurov

Proceedings Volume 2842, (1996) https://doi.org/10.1117/12.262732

KEYWORDS: Fabry–Perot interferometers, Spatial light modulators, Pulsed laser operation, Electrodes, Power supplies, Tunable lasers, Carbon dioxide lasers, Resonators, Capacitors, Far infrared

Read Abstract +

Proceedings Article | 7 October 1996 Paper

Paper

Low-coherence reflectometry based on DFWM in a thin liquid layer

Vladimir Fleurov, Christopher Lawson, Denise Brown-Anderson, Alex Dergachev, Sergey Mirov, Robert Lindquist

Proceedings Volume 2853, (1996) https://doi.org/10.1117/12.253467

KEYWORDS: Laser scattering, Scattering, Laser beam diagnostics, Coherence (optics), Scattering media, Nonlinear optics, Optical filters, Phase conjugation, Mirrors, Laser sources

Read Abstract +

Proceedings Article | 7 October 1996 Paper

Paper

Nonlinear optical characterizations of metal-organic complexes with a wavelength tunable color center laser

Vladimir Fleurov, Christopher Lawson, David Gale, Gary Gray

Proceedings Volume 2853, (1996) https://doi.org/10.1117/12.253477

KEYWORDS: Absorption, Nonlinear optics, Laser beam diagnostics, Color center lasers, Metals, Refractive index, Nd:YAG lasers, Refraction, Transition metals, Nonlinear response

Read Abstract +

Showing 5 of 19 publications

SIGN IN TO:

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Advertisement

Advertisement