Dr. Vladimir A. Zlobin Profile

Dr. Vladimir A. Zlobin

Head of Group at All-Russian Electrotechnical Institute

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Author

Publications (5)

Proceedings Article | 24 April 2008 Paper

Electron beam nanolithography and testing: ways of increasing the resolution and the throughput

Vladimir Zlobin

Proceedings Volume 6995, 69950D (2008) https://doi.org/10.1117/12.781847

KEYWORDS: Lithography, Electron beam lithography, Electron beams, Semiconducting wafers, Photomasks, Silicon, Scanning electron microscopy, Nanolithography, Charged-particle lithography, Extreme ultraviolet lithography

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Proceedings Article | 2 June 2005 Paper

Development of electron beam lithography for nanoscale devices

Vladimir Zlobin

Proceedings Volume 5824, (2005) https://doi.org/10.1117/12.604662

KEYWORDS: Lithography, Electron beam lithography, Electron beams, Semiconducting wafers, Charged-particle lithography, Photomasks, Silicon, X-ray lithography, Microelectronics, Glasses

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Proceedings Article | 13 October 2003 Paper

Optical properties of aqueous morphine solutions

Pavel Kuznetsov, Anna Gracheva, Vladimir Zlobin, Georgy Nazarov, Nina Kuznetsova, Svetlana Rogacheva

Proceedings Volume 5068, (2003) https://doi.org/10.1117/12.518858

KEYWORDS: Molecules, Hydrogen, Light scattering, Process modeling, Optical properties, Particles, Chemical compounds, Molecular mechanisms, Biological research, Information operations

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Proceedings Article | 7 July 1997 Paper

Development of electron-beam lithography for power semiconductor devices

Vladimir Zlobin, Olga Vasiljeva

Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275802

KEYWORDS: Semiconducting wafers, Lithography, Electron beam lithography, Semiconductors, Photomasks, Critical dimension metrology, Mask making, Silicon, Oxides, Edge roughness

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Proceedings Article | 19 May 1995 Paper

Master masks for big patterns by electron-beam lithography

Vladimir Zlobin, V. Mamonov, Olga Vasiljeva

Proceedings Volume 2437, (1995) https://doi.org/10.1117/12.209181

KEYWORDS: Computing systems, Electron beam lithography, Photomasks, Process modeling, Semiconductors, Lithography, Semiconductor lasers, Mask making, Beam shaping, Visualization

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