Weizhong Huang
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 9 April 2024 Presentation + Paper
Proceedings Volume 12957, 1295712 (2024) https://doi.org/10.1117/12.3009801
KEYWORDS: Extreme ultraviolet lithography, Photoresist materials, Adhesion, Etching, Semiconducting wafers, Extreme ultraviolet, Silicon, Line width roughness, Chemically amplified resists, Amorphous carbon

Proceedings Article | 21 November 2023 Presentation + Paper
Proceedings Volume 12750, 127500I (2023) https://doi.org/10.1117/12.2687546
KEYWORDS: Factor analysis, Extreme ultraviolet lithography, Surface roughness, Photoresist materials, Statistical analysis, Line width roughness, Extreme ultraviolet, Metal oxides, Lithography

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top