A large screening of underlayer materials for extreme ultraviolet lithography is reported in this work. The main motivation for the screening of functional materials lies in the search for dose reduction and defect mitigation. Some promising results shown in here prove that the usage of functionalized underlayers and primers improves the pattern quality without adding to the complexity of litho processing.
It is renowned that underlayers can enhance photoresist performance in extreme ultraviolet lithography via chemical/physical interactions, but these effects are elusive to identify. Using factorial analysis, we pinpoint which underlayer parameters have or have not an effect on the lithography patterning quality of chemically amplified and metal oxide resists in three proposed experiments. Experimental factors were underlayer thickness, density, surface roughness, surface energy and composition; the outputs were: dose, exposure latitude, line roughness and its correlation length.
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