Dr. Willem Op 't Root Profile

Dr. Willem Op 't Root

at ASML Netherlands BV

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Author

Publications (3)

Proceedings Article | 10 April 2024 Presentation + Paper

Focus sensing using placement and CD variation for high NA EUV lithography

Victor Calado, Simon Mathijssen, Eelco van Setten, Jo Finders, Friso Wittebrood, Wim Bouman, Kaustuve Bhattacharyya, Willem op 't Root, Elliott McNamara, Matthew McLaren

Proceedings Volume 12953, 1295307 (2024) https://doi.org/10.1117/12.3010835

KEYWORDS: Semiconducting wafers, Personal protective equipment, Metrology, Logic, Scanning electron microscopy, Metals, Extreme ultraviolet lithography, Optical testing, Matrices, Image classification

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Proceedings Article | 10 April 2024 Poster + Paper

Optical diffraction-based methodology to measure on-product EUV exposure focus variations

Willem op 't Root, Jungwan Park, Youngsun Nam, Seho Kim, Hyunwoo Hwang, Jeong Heung Kong, Sang-Ho Yun, Youngseog Kang, Bram Klaassen, Karel van den Bos, Zhe Hou, Aileen Soco, Don Cheon, Jong-Hyuk Yim, Hong-seung Song, Mi-Yeon Baek

Proceedings Volume 12955, 129552Q (2024) https://doi.org/10.1117/12.3010370

KEYWORDS: Semiconducting wafers, Metrology, Extreme ultraviolet lithography, Calibration, Extreme ultraviolet, Diffraction gratings, Scanners, Diffraction, Printing, Optical metrology

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Proceedings Article | 28 May 2004 Paper

Experimental verification of a model based decomposition method for double dipole lithography

Mark Eurlings, Stephen Hsu, Eric Hendrickx, Willem op 't Root, Thomas Laidig, Tsann-Bim Chiou, Alek Chen, Fung Chen, Geert Vandenberghe, Jo Finders

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535221

KEYWORDS: Line width roughness, Electroluminescence, Scanning electron microscopy, Photomasks, Lithography, Design for manufacturing, Semiconducting wafers, Printing, Spatial frequencies, Optical proximity correction

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