Dr. William P. Ballard Profile

Dr. William P. Ballard

Sr Scientist at Sandia National Labs California

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Publications (6)

Proceedings Article | 16 June 2003 Paper

Lithographic characterization of improved projection optics in the EUVL engineering test stand

Donna O'Connell, Sang Hun Lee, William Ballard, Daniel Tichenor, Louis Bernardez, Steven Haney, Terry Johnson, Pamela Barr, Alvin Leung, Karen Jefferson, William Replogle, John Goldsmith, Henry Chapman, Patrick Naulleau, Stefan Wurm, Eric Panning

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484967

KEYWORDS: Projection systems, Lithography, Monochromatic aberrations, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Scanning electron microscopy, Line edge roughness, Reticles, Wavefronts

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Proceedings Article | 16 June 2003 Paper

System and process learning in a full-field high-power EUVL alpha tool

William Ballard, Daniel Tichenor, Donna O'Connell, Luis Bernardez, Robert Lafon, Richard Anderson, Alvin Leung, Kenneth Williams, Steven Haney, Yon Perras, Karen Jefferson, Therese Porter, Daniel Knight, Pamela Barr, James Van de Vreugde, Richard Campiotti, Mark Zimmerman, Terry Johnson, Leonard Klebanoff, Philip Grunow, Samuel Graham, Dean Buchenauer, William Replogle, Tony Smith, John Wronosky, Joel Darnold, Kenneth Blaedel, Henry Chapman, John Taylor, Layton Hale, Gary Sommargren, Eric Gullikson, Patrick Naulleau, Kenneth Goldberg, Sang Hun Lee, Harry Shields, Randall St. Pierre, Samuel Ponti

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.482791

KEYWORDS: Semiconducting wafers, Reticles, Extreme ultraviolet, Sensors, Extreme ultraviolet lithography, Lithography, Projection systems, Xenon, EUV optics, Fiber optic illuminators

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Proceedings Article | 1 July 2002 Paper

Lithographic evaluation of the EUV engineering test stand

Sang Hun Lee, Daniel Tichenor, William Ballard, Luis Bernardez, John Goldsmith, Steven Haney, Karen Jefferson, Terry Johnson, Alvin Leung, Donna O'Connell, William Replogle, John Wronosky, Kenneth Blaedel, Patrick Naulleau, Kenneth Goldberg, Eric Gullikson, Henry Chapman, Stefan Wurm, Eric Panning, Pei-yang Yan, Guojing Zhang, John Bjorkholm, Glenn Kubiak, Donald Sweeney, David Attwood, Charles Gwyn

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472300

KEYWORDS: Extreme ultraviolet, Lithography, Projection systems, Semiconducting wafers, Extreme ultraviolet lithography, Photomasks, Reticles, Printing, Point spread functions, Image resolution

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Proceedings Article | 1 July 2002 Paper

Performance upgrades in the EUV engineering test stand

Daniel Tichenor, William Replogle, Sang Hun Lee, William Ballard, Alvin Leung, Glenn Kubiak, Leonard Klebanoff, Samual Graham, John Goldsmith, Karen Jefferson, John Wronosky, Tony Smith, Terry Johnson, Harry Shields, Layton Hale, Henry Chapman, John Taylor, Donald Sweeney, James Folta, Gary Sommargren, Kenneth Goldberg, Patrick Naulleau, David Attwood, Eric Gullikson

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472328

KEYWORDS: Semiconducting wafers, Sensors, Extreme ultraviolet, Reticles, Projection systems, Extreme ultraviolet lithography, Printing, Lithography, Fiber optic illuminators, Wavefronts

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Proceedings Article | 1 July 2002 Paper

High-power laser-produced-plasma EUV source

William Ballard, Luis Bernardez, Robert Lafon, Richard Anderson, Yon Perras, Alvin Leung, Harry Shields, Michael Petach, Randall St. Pierre, Robert Bristol

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472303

KEYWORDS: Extreme ultraviolet, Xenon, Liquids, Plasma, Lithography, Extreme ultraviolet lithography, Mirrors, High power lasers, Laser energy, Sensors

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Proceedings Article | 20 December 2001 Paper

Initial results from the EUV engineering test stand

Daniel Tichenor, Avijit Ray-Chaudhuri, Sang Hun Lee, Henry Chapman, William Replogle, Kurt Berger, Richard Stulen, Glenn Kubiak, Leonard Klebanoff, John Wronosky, Donna O'Connell, Alvin Leung, Karen Jefferson, William Ballard, Layton Hale, Kenneth Blaedel, John Taylor, James Folta, Eberhard Spiller, Regina Soufli, Gary Sommargren, Donald Sweeney, Patrick Naulleau, Kenneth Goldberg, Eric Gullikson, Jeffrey Bokor, David Attwood, Uwe Mickan, Ralph Hanzen, Eric Panning, Pei-yang Yan, John Bjorkholm, Charles Gwyn

Proceedings Volume 4506, (2001) https://doi.org/10.1117/12.450953

KEYWORDS: Extreme ultraviolet, Reticles, Projection systems, Semiconducting wafers, Lithography, Monochromatic aberrations, Extreme ultraviolet lithography, Plasma, Sensors, Mirrors

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Showing 5 of 6 publications

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