Mr. William F. Guthrie Profile

William F. Guthrie

at National Institute of Standards and Technology

SPIE Involvement:

Author

Publications (6)

SPIE Journal Paper | 9 March 2016

Process optimization for lattice-selective wet etching of crystalline silicon structures

Ronald Dixson, William Guthrie, Richard Allen, Ndubuisi Orji, Michael Cresswell, Christine Murabito

JM3, Vol. 15, Issue 01, 014503, (March 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.1.014503

KEYWORDS: Etching, Silicon, Calibration, Crystals, Standards development, Scanning electron microscopy, Oxides, Metrology, Wet etching, Photomasks

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Proceedings Article | 5 April 2007 Paper

Single crystal critical dimension reference materials (SCCDRM): process optimization for the next generation of standards

Ronald Dixson, William Guthrie, Michael Cresswell, Richard Allen, Ndubuisi Orji

Proceedings Volume 6518, 651815 (2007) https://doi.org/10.1117/12.713289

KEYWORDS: Etching, Calibration, Standards development, Scanning electron microscopy, Silicon, Photomasks, Oxides, Metrology, Ultrasonics, Atomic force microscopy

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Proceedings Article | 24 March 2006 Paper

Traceable atomic force microscope dimensional metrology at NIST

Ronald Dixson, Ndubuisi Orji, Joseph Fu, Michael Cresswell, Rich Allen, Will Guthrie

Proceedings Volume 6152, 61520P (2006) https://doi.org/10.1117/12.656803

KEYWORDS: Calibration, Metrology, Standards development, Atomic force microscopy, Dimensional metrology, Atomic force microscope, Prototyping, Error analysis, Crystals, Photomasks

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Proceedings Article | 10 May 2005 Paper

CD-AFM reference metrology at NIST and SEMATECH

Ronald Dixson, Joseph Fu, Ndubuisi Orji, William Guthrie, Richard Allen, Michael Cresswell

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.601972

KEYWORDS: Metrology, Calibration, Atomic force microscopy, Standards development, Transmission electron microscopy, Critical dimension metrology, Silicon, Scanning electron microscopy, Semiconductor manufacturing, Crystals

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Proceedings Article | 10 May 2005 Paper

CD reference features with sub-five nanometer uncertainty

M. Cresswell, R. Dixson, W. Guthrie, R. Allen, C. Murabito, B. Park, J. Martinez de Pinillos, A. Hunt

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.606807

KEYWORDS: Atomic force microscopy, Calibration, Critical dimension metrology, Cadmium, Metrology, Semiconducting wafers, Platinum, Silicon, Scanning electron microscopy, Etching

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Proceedings Article | 16 July 2002 Paper

CD reference materials for sub-10th um applications

Michael Cresswell, E. Hal Bogardus, J.V. Martinez de Pinillos, Marylyn Bennett, Richard Allen, William Guthrie, Christine Murabito, Barbara am Ende, Loren Linholm

Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473450

KEYWORDS: Cadmium, Silicon, Semiconducting wafers, Resistance, Oxides, Critical dimension metrology, Optical lithography, Etching, Calibration, Ions

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Showing 5 of 6 publications

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