Dr. Wolfgang Vollrath Profile

Dr. Wolfgang Vollrath

Chief Scientist at KLA MIE GmbH

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Author

Publications (4)

Proceedings Article | 17 July 2006 Paper

Ultra-high-performance microscope objectives: the state of the art in design, manufacturing, and testing

Thomas Sure, Lambert Danner, Peter Euteneuer, Gerhard Hoppen, Armin Pausch, Wolfgang Vollrath

Proceedings Volume 6342, 63420E (2006) https://doi.org/10.1117/12.692202

KEYWORDS: Objectives, Microscopes, Confocal microscopy, Deep ultraviolet, Luminescence, Point spread functions, Wavefronts, Refractive index, Manufacturing, Microscopy

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Proceedings Article | 19 August 2005 Paper

Ultra-high-resolution DUV microscope optics for semiconductor applications

Wolfgang Vollrath

Proceedings Volume 5865, 58650E (2005) https://doi.org/10.1117/12.624560

KEYWORDS: Deep ultraviolet, Objectives, Microscopes, Microscopy, Photomasks, Metrology, Semiconductors, Semiconducting wafers, Ultraviolet radiation, Optical design

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Proceedings Article | 16 June 2005 Paper

DUV water immersion technology extends linearity: first results from the new 65nm node CD metrology system LWM500 WI

Frank Hillmann, Stefan Dobereiner, Christian Gittinger, Richard Reiter, Gunther Falk, Hans-Jurgen Bruck, Gerd Scheuring, Artur Bosser, Michael Heiden, Gerhard Hoppen, Wolfgang Sulik, Wolfgang Vollrath

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637295

KEYWORDS: Photomasks, Objectives, Water, Deep ultraviolet, Critical dimension metrology, Binary data, Optical testing, Semiconducting wafers, Halftones, Refractive index

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Proceedings Article | 2 November 2000 Paper

Optical microscopy at sub-0.1-um resolution for semiconductor applications

Wolfgang Vollrath

Proceedings Volume 4099, (2000) https://doi.org/10.1117/12.405825

KEYWORDS: Deep ultraviolet, Microscopes, Objectives, Microscopy, Confocal microscopy, Optical microscopy, Semiconducting wafers, Wafer-level optics, Semiconductors, Photonic microstructures

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