Dr. Woo-Yung Jung Profile

Dr. Woo-Yung Jung

at SK Hynix, Inc.

SPIE Involvement:

Author

Publications (15)

Proceedings Article | 2 May 2018 Presentation + Paper

Presentation + Paper

Improvement of nano-imprint lithography performance for device fabrication

Takuya Kono, Masayuki Hatano, Hiroshi Tokue, Kei Kobayashi, Hirokazu Kato, Masato Suzuki, Kazuya Fukuhara, Tetsuro Nakasugi, Eun Hyuk Choi, Wooyung Jung

Proceedings Volume 10584, 105840V (2018) https://doi.org/10.1117/12.2297294

KEYWORDS: Nanoimprint lithography, Semiconducting wafers, Optical alignment, Overlay metrology, Distortion, Particles, Optical lithography, Photoresist processing, Lithography, Extreme ultraviolet lithography

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Proceedings Article | 23 March 2018 Paper

Paper

Process control technology for nanoimprint lithography

Hirotaka Tsuda, Hirokazu Washida, Motofumi Komori, Takuya Kono, Tetsuro Nakasugi, Wooyung Jung

Proceedings Volume 10584, 105841D (2018) https://doi.org/10.1117/12.2297332

KEYWORDS: Nanoimprint lithography, Process control, Lithography, Photoresist processing, Nanotechnology, Manufacturing, Critical dimension metrology, Photomasks, Line edge roughness, Etching

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Proceedings Article | 21 March 2018 Paper

Paper

Material development for high-throughput nanoimprint lithography

Kei Kobayashi, Takayuki Nakamura, Hirokazu Kato, Masayuki Hatano, Hiroshi Tokue, Tetsuro Nakasugi, Eun Hyuk Choi, Wooyung Jung, Takuya Kono

Proceedings Volume 10584, 105841F (2018) https://doi.org/10.1117/12.2297307

KEYWORDS: Nanoimprint lithography, Photoresist processing, Optical lithography, Image processing, Ultraviolet radiation, Diffusion, Interfaces, Lithography, Liquids, Etching

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Proceedings Article | 3 April 2017 Paper

Paper

Overlay control for nanoimprint lithography

Kazuya Fukuhara, Masato Suzuki, Masaki Mitsuyasu, Takuya Kono, Tetsuro Nakasugi, Yonghyun Lim, Wooyung Jung

Proceedings Volume 10144, 1014409 (2017) https://doi.org/10.1117/12.2256715

KEYWORDS: Nanoimprint lithography, Overlay metrology, Optical alignment, Lithography, Semiconducting wafers, Distortion, Process control, Error analysis, Silicon, Semiconductor manufacturing

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Proceedings Article | 28 March 2017 Presentation + Paper

Presentation + Paper

Required metrology and inspection for nanoimprint lithography

Masafumi Asano, Hideaki Abe, Kazuto Matsuki, Ryoji Yoshikawa, Motofumi Komori, Takashi Hirano, Shinji Mikami, Yongho Kim, Eunhyuk Choi, Woo-Yung Jung

Proceedings Volume 10145, 101450J (2017) https://doi.org/10.1117/12.2258369

KEYWORDS: Inspection, Nanoimprint lithography, Metrology, Lithography, Process control, Scatterometry, Semiconducting wafers, Optical inspection, Scanning electron microscopy, Optical lithography

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Proceedings Article | 21 March 2017 Presentation + Paper

Presentation + Paper

Study of nanoimprint lithography (NIL) for HVM of memory devices

Takuya Kono, Masayuki Hatano, Hiroshi Tokue, Kei Kobayashi, Masato Suzuki, Kazuya Fukuhara, Masafumi Asano, Tetsuro Nakasugi, Eun Hyuk Choi, Wooyung Jung

Proceedings Volume 10144, 1014406 (2017) https://doi.org/10.1117/12.2257951

KEYWORDS: Nanoimprint lithography, Overlay metrology, Lithography, Line edge roughness, Semiconductors, Critical dimension metrology, Nanotechnology, Semiconducting wafers, Optical lithography, Particles, Distortion, Optical alignment, Inspection

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Proceedings Article | 21 March 2017 Paper

Paper

The opportunity and challenge of spin coat based nanoimprint lithography

Wooyung Jung, Jungbin Cho, Eunhyuk Choi, Yonghyun Lim, Cheolkyu Bok, Masatoshi Tsuji, Kei Kobayashi, Takuya Kono, Tetsuro Nakasugi

Proceedings Volume 10144, 1014412 (2017) https://doi.org/10.1117/12.2257845

KEYWORDS: Particles, Semiconducting wafers, Nanoimprint lithography, Coating, Optical lithography, Logic, Manufacturing, Defect inspection, High volume manufacturing, Lithography, Ultraviolet radiation, Photoresist processing

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Proceedings Article | 22 March 2016 Paper

Paper

NIL defect performance toward high volume mass production

Masayuki Hatano, Kei Kobayashi, Hiroyuki Kashiwagi, Hiroshi Tokue, Takuya Kono, Nakasugi Tetsuro, Eun Hyuk Choi, Wooyung Jung

Proceedings Volume 9777, 97770B (2016) https://doi.org/10.1117/12.2218972

KEYWORDS: Defect detection, Process control, Nanoimprint lithography, Lithography, Line edge roughness, Semiconductors, Critical dimension metrology, Silicon, Semiconducting wafers, Industrial chemicals, Contamination, Chemical analysis, Photoresist processing, Extreme ultraviolet lithography, Photomasks, Image processing

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Proceedings Article | 8 March 2016 Paper

Paper

Scatterometry-based process control for nanoimprint lithography

Masafumi Asano, Hirotaka Tsuda, Motofumi Komori, Kazuto Matsuki, Hideaki Abe, Woo-Yung Jung

Proceedings Volume 9778, 977820 (2016) https://doi.org/10.1117/12.2218994

KEYWORDS: Nanoimprint lithography, Critical dimension metrology, Process control, Scatterometry, Etching, Manufacturing, Photoresist processing, Metrology, Image processing, Lithography, Semiconducting wafers, Optical lithography, Control systems, Photomasks

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Proceedings Article | 5 April 2012 Paper

Paper

How to minimize CD variation and overlay degradation induced by film stress

Woo-Yung Jung, Yong-Hyun Lim, Shin-Ae Park, Sang-Joon Ahn, Ji-Hyun Lee, Jung-A Yoo, Seung-Ho Pyi, Jin-Woong Kim

Proceedings Volume 8324, 83242L (2012) https://doi.org/10.1117/12.916035

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Overlay metrology, Photoresist processing, Carbon, Optical lithography, Temperature metrology, Semiconductors, Metrology, Wafer inspection

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Proceedings Article | 16 April 2011 Paper

Paper

A study of an acid-induced defect on chemically amplified photoresist applied to sub-30nm NAND flash memory

Yong-Hyun Lim, Jae-Doo Eom, Woo-Yung Jung, Min-Sik Jang, Byung-Seok Lee, Jin-Woong Kim

Proceedings Volume 7972, 79722W (2011) https://doi.org/10.1117/12.869936

KEYWORDS: Photoresist materials, Oxides, Silicon, Silicon films, Semiconducting wafers, Photoresist developing, Diffusion, Ions, Gases, Chemical reactions

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Proceedings Article | 16 March 2009 Paper

Paper

Process step reduction at negative tone spacer patterning technique using developer soluble bottom ARC

Woo-Yung Jung, Jae-Doo Eom, Sung-Min Jeon, Ji-Hyun Lee, Byung-Seok Lee, Jin-Woong Kim

Proceedings Volume 7274, 72740F (2009) https://doi.org/10.1117/12.814020

KEYWORDS: Optical lithography, Chemical mechanical planarization, Photomasks, Etching, Diffusion, Line width roughness, Bridges, Semiconductors, Astronomical imaging, Current controlled current source

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Proceedings Article | 7 March 2008 Paper

Paper

Double patterning of contact array with carbon polymer

Woo-Yung Jung, Guee-Hwang Sim, Sang-Min Kim, Choi-Dong Kim, Sung-Min Jeon, Keunjun Kim, Sang-Wook Park, Byung-Seok Lee, Sung-Ki Park, Hoon-Hee Cho, Ji-Soo Kim

Proceedings Volume 6924, 69240C (2008) https://doi.org/10.1117/12.771092

KEYWORDS: Silicon, Etching, Carbon, Polymers, Optical lithography, Silicon carbide, Coating, Line width roughness, Double patterning technology, System on a chip

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Proceedings Article | 27 March 2007 Paper

Paper

Patterning with amorphous carbon spacer for expanding the resolution limit of current lithography tool

Woo-Yung Jung, Sang-Min Kim, Choi-Dong Kim, Guee-Hwang Sim, Sung-Min Jeon, Sang-Wook Park, Byung-Seok Lee, Sung-Ki Park, Ji-Soo Kim, Lee-Sang Heon

Proceedings Volume 6520, 65201C (2007) https://doi.org/10.1117/12.707275

KEYWORDS: Double patterning technology, Optical lithography, Etching, Carbon, Critical dimension metrology, Polymers, Lithography, Overlay metrology, Manufacturing, Photomasks

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Proceedings Article | 13 March 2006 Paper

Paper

Patterning with spacer for expanding the resolution limit of current lithography tool

Woo-Yung Jung, Choi-Dong Kim, Jae-Doo Eom, Sung-Yoon Cho, Sung-Min Jeon, Jong-Hoon Kim, Jae-In Moon, Byung-Seok Lee, Sung-Ki Park

Proceedings Volume 6156, 61561J (2006) https://doi.org/10.1117/12.650991

KEYWORDS: Photomasks, Etching, Critical dimension metrology, Lithography, Oxides, Optical lithography, Chemical mechanical planarization, Resolution enhancement technologies, Semiconductors, Reticles

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Showing 5 of 15 publications

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