Dr. Xin Zhou Profile

Dr. Xin Zhou

Engineer at Samsung Semiconductor Inc.

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Author

Publications (12)

Proceedings Article | 23 March 2011 Paper

Overcome the process limitation by using inverse lithography technology with assist feature

Yeon-Ah Shim, Sungho Jun, Jaeyoung Choi, Kwangseon Choi, Jae-won Han, Kechang Wang, John McCarthy, Guangming Xiao, Grace Dai, DongHwan Son, Xin Zhou, Tom Cecil, David Kim, Ki-Ho Baik

Proceedings Volume 7973, 79732S (2011) https://doi.org/10.1117/12.870704

KEYWORDS: Lithography, SRAF, Photomasks, Image processing, Optical lithography, Optical proximity correction, Semiconducting wafers, Resolution enhancement technologies, Overlay metrology, Logic

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Proceedings Article | 23 March 2011 Paper

Enhancing fullchip ILT mask synthesis capability for IC manufacturability

Thomas Cecil, Chris Ashton, David Irby, Lan Luan, D. H. Son, Guangming Xiao, Xin Zhou, David Kim, Bob Gleason, H. J. Lee, W. J. Sim, M. J. Hong, S. G. Jung, S. S. Suh, S. W. Lee

Proceedings Volume 7973, 79731C (2011) https://doi.org/10.1117/12.882814

KEYWORDS: Photomasks, Lithography, Optical proximity correction, Manufacturing, SRAF, Image segmentation, Inverse problems, Optimization (mathematics), Electronics, Electroluminescence

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Proceedings Article | 23 March 2011 Paper

Hotspot fixing using ILT

Woojoo Sim, Sunggon Jung, Hyun-Jong Lee, Sungsoo Suh, Jung-Hoon Ser, Seong-Woon Choi, Chang-Jin Kang, Thomas Cecil, Christopher Ashton, David Irby, Xin Zhou, D.H. Son, Guangming Xiao, David Kim

Proceedings Volume 7973, 79731L (2011) https://doi.org/10.1117/12.879781

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Photovoltaics, Data modeling, Lithography, SRAF, Calibration, Nanoimprint lithography, Resolution enhancement technologies

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Proceedings Article | 29 September 2010 Paper

Improving model prediction accuracy for ILT with aggressive SRAFs

Sunggon Jung, Woojoo Sim, Moongyu Jeong, Junghoon Ser, Sungwoo Lee, Seoung-woon Choi, Xin Zhou, Lan Luan, Thomas Cecil, Donghwan Son, Robert Gleason, David Kim

Proceedings Volume 7823, 782311 (2010) https://doi.org/10.1117/12.864528

KEYWORDS: SRAF, Optical proximity correction, Scanning electron microscopy, Calibration, Diffusion, Photomasks, Lithography, Performance modeling, Cadmium sulfide, Critical dimension metrology

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Proceedings Article | 27 May 2010 Paper

Improvement of KrF contact layer by inverse lithography technology with assist feature

Sungho Jun, Yeon-Ah Shim, Jaeyoung Choi, Kwangsun Choi, Jae-won Han, Kechang Wang, John McCarthy, Guangming Xiao, Grace Dai, DongHwan Son, Xin Zhou, Tom Cecil, David Kim, KiHo Baik

Proceedings Volume 7748, 77481V (2010) https://doi.org/10.1117/12.868563

KEYWORDS: Lithography, SRAF, Photomasks, Image processing, Optical lithography, Optical proximity correction, Resolution enhancement technologies, Lithographic illumination, Scanners, Computer simulations

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Proceedings Article | 4 March 2010 Paper

Methods for assessing empirical model parameters and calibration pattern measurements

Xin Zhou, Eldar Khaliullin, Lan Luan

Proceedings Volume 7640, 764038 (2010) https://doi.org/10.1117/12.847734

KEYWORDS: Data modeling, Calibration, Semiconducting wafers, Process modeling, Cadmium sulfide, Computer simulations, Optical proximity correction, Metrology, Statistical modeling, Lithography

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Proceedings Article | 23 September 2009 Paper

Fast and accurate computation of partially coherent imaging by stacked pupil shift operator

Yaogang Lian, Xin Zhou

Proceedings Volume 7488, 74883G (2009) https://doi.org/10.1117/12.833488

KEYWORDS: Coherence imaging, Lithography, Photomasks, Computer simulations, Light, Matrix multiplication, Lithographic illumination, System on a chip, Device simulation, Apodization

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Proceedings Article | 23 September 2009 Paper

Patterning of 90nm node flash contact hole with assist feature using KrF

Yeonah Shim, Sungho Jun, Jaeyoung Choi, Kwangseon Choi, Jae-won Han, Kechang Wang, John McCarthy, Guangming Xiao, Grace Dai, DongHwan Son, Xin Zhou, Thomas Cecil, David Kim, KiHo Baik

Proceedings Volume 7488, 748837 (2009) https://doi.org/10.1117/12.833499

KEYWORDS: Lithography, SRAF, Photomasks, Optical lithography, Image processing, Lithographic illumination, Optical proximity correction, Resolution enhancement technologies, Scanners, Computer simulations

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Proceedings Article | 23 September 2009 Paper

What is a good empirical model?

Eldar Khaliullin, Yaogang Lian, Mark Davey, Xin Zhou

Proceedings Volume 7488, 74883P (2009) https://doi.org/10.1117/12.829731

KEYWORDS: Data modeling, Calibration, Process modeling, Lithography, Cadmium sulfide, Estimation theory, Optical proximity correction, Statistical analysis, Statistical modeling, Computer simulations

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Proceedings Article | 27 February 2009 Paper

Hyperpolarized 129Xe magnetic resonance imaging of a rat model of transient ischemic stroke

Ronn Walvick, Birgul Bastan, Austin Reno, Joey Mansour, Yanping Sun, Xin Zhou, Mary Mazzanti, Marc Fisher, Christopher Sotak, Mitchell Albert

Proceedings Volume 7262, 726209 (2009) https://doi.org/10.1117/12.812344

KEYWORDS: Magnetic resonance imaging, Brain, Tissues, Blood, Polarization, Ischemic stroke, Xenon, Diagnostics, Diffusion, Ischemia

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Proceedings Article | 19 March 2008 Paper

Validation and application of a mask model for inverse lithography

Thuc Dam, Xin Zhou, Dongxue Chen, Anthony Adamov, Danping Peng, Bob Gleason

Proceedings Volume 6925, 69251J (2008) https://doi.org/10.1117/12.773081

KEYWORDS: Finite-difference time-domain method, Calibration, Photomasks, SRAF, 3D modeling, Panoramic photography, Lithography, Image processing, Polarization, Image transmission

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Proceedings Article | 26 March 2007 Paper

Distributed model calibration using Levenberg-Marquardt algorithm

Mark Lu, Liang Zhu, Li Ling, Gary Zhang, Walter Chan, Xin Zhou

Proceedings Volume 6520, 65203C (2007) https://doi.org/10.1117/12.711564

KEYWORDS: Process modeling, Calibration, Computing systems, Distributed computing, Data modeling, Lithography, Semiconductors, Optimization (mathematics), Immersion lithography, Numerical stability

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Showing 5 of 12 publications

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