Yaniv Abramovitz
at Applied Materials Israel Ltd
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 25 June 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Wafer-level optics, Metrology, Scanning electron microscopy, Transmission electron microscopy, Photomasks, Dysprosium, Line edge roughness, Semiconducting wafers, Overlay metrology, Scanning transmission electron microscopy

Proceedings Article | 24 March 2020 Presentation + Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Wafer-level optics, Metrology, Etching, Scanning electron microscopy, Transmission electron microscopy, Photomasks, Semiconducting wafers, Overlay metrology

Proceedings Article | 8 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Metrology, Lithographic illumination, Scanners, Photomasks, Optical proximity correction, SRAF, Neodymium, Overlay metrology, Personal protective equipment

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