Dr. Yoshihiro Tezuka Profile

Dr. Yoshihiro Tezuka

Sr. Technologist at Intel Kabushiki Kaisha

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Publications (15)

Proceedings Article | 15 September 2022 Presentation

Advanced and affordable EUV lithography with deep-dive mitigation of ML defects

Yoshihiro Tezuka

Proceedings Volume PC12325, PC123250H (2022) https://doi.org/10.1117/12.2656146

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Proceedings Article | 23 March 2021 Presentation + Paper

Laser-assisted discharge produced plasma (LDP) EUV source for actinic patterned mask inspection (APMI)

Safak Sayan, Kishore Chakravorty, Yusuke Teramoto, Takahiro Shirai, Shunichi Morimoto, Hidenori Watanabe, Yoshihiko Sato, Kazuya Aoki, Ted Liang, Yoshihiro Tezuka, Marieke Jager, Firoz Ghadiali, Frank Abboud, Steven Carson

Proceedings Volume 11609, 116090L (2021) https://doi.org/10.1117/12.2588788

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Proceedings Article | 23 March 2020 Paper

Development and deployment of advanced multi-beam mask writer

Mahesh Chandramouli, Bin Liu, Reid Juday, Bassam Shamoun, Yulia Korobko, Andrew Sowers, Yoshihiro Tezuka, Frank Abboud

Proceedings Volume 11324, 113240K (2020) https://doi.org/10.1117/12.2556552

KEYWORDS: Photomasks, Vestigial sideband modulation, Raster graphics, Lithography, Electrodes, Overlay metrology, Optical lithography, Manufacturing, Printing, Extreme ultraviolet

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Proceedings Article | 23 March 2020 Paper

EUV mask infrastructure and actinic pattern mask inspection

Ted Liang, Yoshihiro Tezuka, Marieke Jager, Kishore Chakravorty, Safak Sayan, Eric Frendberg, Srinath Satyanarayana, Firoz Ghadiali, Guojing Zhang, Frank Abboud

Proceedings Volume 11323, 1132310 (2020) https://doi.org/10.1117/12.2554496

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Pellicles, Extreme ultraviolet lithography, Defect detection, Optical inspection, Semiconducting wafers, Deep ultraviolet, EUV optics

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Proceedings Article | 21 October 2014 Paper

Mask data processing in the era of multibeam writers

Frank Abboud, Michael Asturias, Maesh Chandramouli, Yoshihiro Tezuka

Proceedings Volume 9235, 92350W (2014) https://doi.org/10.1117/12.2072135

KEYWORDS: Photomasks, Semiconducting wafers, Vestigial sideband modulation, Monte Carlo methods, Diffusion, Data processing, Optical proximity correction, Electron beam lithography, Raster graphics, Computer aided design

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Proceedings Article | 16 March 2007 Paper

EUV exposure experiment using programmed multilayer defects for refining printability simulation

Yoshihiro Tezuka, Jerry Cullins, Yuusuke Tanaka, Takeo Hashimoto, Iwao Nishiyama, Tsutomu Shoki

Proceedings Volume 6517, 65172M (2007) https://doi.org/10.1117/12.711967

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Computer simulations, Transmission electron microscopy, Extreme ultraviolet, Printing, Image processing, Cadmium, Photoresist processing

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Proceedings Article | 15 March 2007 Paper

EUVL mask substrate defect print study

Jerry Cullins, Yoshihiro Tezuka, Iwao Nishiyama, Takeo Hashimoto, Tsutomu Shoki

Proceedings Volume 6517, 65170E (2007) https://doi.org/10.1117/12.714358

KEYWORDS: Photomasks, Semiconducting wafers, Extreme ultraviolet lithography, Printing, Bridges, Extreme ultraviolet, Atomic force microscopy, Statistical analysis, Coating, Chromium

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Proceedings Article | 24 March 2006 Paper

Detection signal analysis of actinic inspection of EUV mask blanks using dark-field imaging

Toshihiko Tanaka, Yoshihiro Tezuka, Tsuneo Terasawa, Toshihisa Tomie

Proceedings Volume 6152, 61523U (2006) https://doi.org/10.1117/12.655154

KEYWORDS: Signal detection, Inspection, Extreme ultraviolet, Mirrors, Defect detection, Light sources, Scattering, Charge-coupled devices, Photomasks, Interference (communication)

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Proceedings Article | 23 March 2006 Paper

Characterization of CCD sensor for actinic mask blank inspection

Yoshihiro Tezuka, Toshihiko Tanaka, Tsuneo Terasawa, Toshihisa Tomie

Proceedings Volume 6151, 61511U (2006) https://doi.org/10.1117/12.655078

KEYWORDS: Charge-coupled devices, Point spread functions, Inspection, CCD image sensors, Clocks, Extreme ultraviolet lithography, Iron, Extreme ultraviolet, Photomasks, X-rays

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Proceedings Article | 6 December 2004 Paper

Actinic detection and signal characterization of multilayer defects on EUV mask blanks

Yoshihiro Tezuka, Masaaki Ito, Tsuneo Terasawa, Toshihisa Tomie

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568379

KEYWORDS: Defect detection, Inspection, Signal detection, Extreme ultraviolet, Atomic force microscopy, Photomasks, Mirrors, Extreme ultraviolet lithography, Statistical analysis, Detection and tracking algorithms

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Proceedings Article | 20 August 2004 Paper

High-speed actinic EUV mask blank inspection with dark-field imaging

Tsuneo Terasawa, Yoshihiro Tezuka, Masaaki Ito, Toshihisa Tomie

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557814

KEYWORDS: Inspection, Photomasks, Signal detection, Extreme ultraviolet, Defect detection, CCD cameras, EUV optics, Extreme ultraviolet lithography, Data acquisition, Light sources

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Proceedings Article | 20 August 2004 Paper

Actinic detection and screening of multilayer defects on EUV mask blanks using dark-field imaging

Yoshihiro Tezuka, Masaaki Ito, Tsuneo Terasawa, Toshihisa Tomie

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557773

KEYWORDS: Inspection, Extreme ultraviolet, Defect detection, Mirrors, Photomasks, Light sources, Charge-coupled devices, Smoothing, Extreme ultraviolet lithography, EUV optics

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Proceedings Article | 20 May 2004 Paper

Actinic detection of multilayer defects on EUV mask blanks using LPP light source and dark-field imaging

Yoshihiro Tezuka, Masaaki Ito, Tsuneo Terasawa, Toshihisa Tomie

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534915

KEYWORDS: Extreme ultraviolet, Inspection, Photomasks, Light sources, Defect detection, Charge-coupled devices, Mirrors, Signal detection, Extreme ultraviolet lithography, Scattering

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The development of defect-free mask blanks including inspection is one of the big challenges for the implementation of extreme ultraviolet lithography (EUVL), especially when the introduction of EUVL is rescheduled to a later technology node. Among others, inspection of multilayer coated mask blanks with no oversight of critical defects and with minimal detection of false defects is a challenging issue for providing mask blanks free of defects or with thorough characterization of any existing defects. MIRAI Project has been developing a novel actinic (at-wavelength) inspection tool for detecting critical multilayer defects using a dark-field imaging and a laser-produced plasma (LPP) light source, expecting better sensitivity and better correlation with printability. The first experimental set up is completed for proof-of-concept (POC) demonstration using 20x Schwarzschild imaging optics and a backsideilluminated CCD. An in-house LPP light source is integrated to optimally illuminate the area of interest by EUV with a wavelength of 13.5nm. For its illuminator, a multilayer-coated elliptical mirror is used to illuminate a mask blank with the EUV that is collected within a wide solid angle from the light source. The first EUV dark-field image is obtained from a mask blank with programmed multilayer defects which are manufactured by locating well-defined patterns before depositing Mo/Si multilayer on EUV mask substrate. All the fabricated multilayer defects down to 70nm in width and 3.5nm in height are detected as clear signals that are distinguishable from the background intensity arising from the scattering by the surface roughness of the multilayer-coated mask blank. We have also detected a phase defect as low as 2nm in height. False defect count was not only zero within the area of view but also statistically confirmed to be less than one within the whole area of a mask blank assuming the extrapolation of observed fluctuation of background intensity is applicable. EUV pulse energy measurements and a CCD speed scaling suggested that the inspection throughput of 2 hours per mask blank will be feasible. The actinic tool based on this scheme will, not only serve for benchmarking with non-actinic tools or support multilayer deposition process improvements, but also be a viable choice for qualification of premium EUV mask blanks.

Proceedings Article | 2 June 2003 Paper

Concept of ultra-fast at-wavelength inspection of defects on a multilayer mask using a laser-produced plasma source

Toshihisa Tomie, Tsuneo Terasawa, Yoshihiro Tezuka, Masaaki Ito

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.482811

KEYWORDS: Inspection, Mirrors, Defect detection, Scattering, Ultrafast phenomena, Defect inspection, Photomasks, Plasma, Sensors, Visible radiation

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Proceedings Article | 2 June 2003 Paper

Design and development of a novel actinic inspection tool for EUV multilayer-coated mask blanks

Yoshihiro Tezuka, Masaaki Ito, Tsuneo Terasawa, Toshihisa Tomie

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.483659

KEYWORDS: Extreme ultraviolet, Inspection, Charge-coupled devices, Defect detection, Light sources, EUV optics, Photomasks, Multilayers, Scattering, Fractal analysis

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Showing 5 of 15 publications

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