Mr. Yoshinori Nagaoka Profile

Yoshinori Nagaoka

RPM & Sales Manager at KLA Japan

SPIE Involvement:

Author

Proceedings Article | 23 October 2015 Paper

EUV or 193i: Who wins the center stage for 7nm node HVM in 2018?

Yoshinori Nagaoka, Junji Miyazaki

Proceedings Volume 9635, 963510 (2015) https://doi.org/10.1117/12.2208944

KEYWORDS: Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Lithography, Pellicles, Double patterning technology, Neodymium, Inspection, Source mask optimization, Scanners

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Proceedings Article | 28 July 2014 Paper

In-die registration measurement using novel model-based approach for advanced technology masks

Shunsuke Sato, Frank Laske, Shinji Kunitani, Tatsuhiko Kamibayashi, Akira Fuse, Naoki Takahashi, Klaus-Dieter Roeth, Slawomir Czerkas, Mehdi Daneshpanah, Yoshinori Nagaoka

Proceedings Volume 9256, 92560E (2014) https://doi.org/10.1117/12.2070399

KEYWORDS: Photomasks, Image registration, Model-based design, Semiconducting wafers, Overlay metrology, Data modeling, Metrology, Semiconductors, Data processing, Metals

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Proceedings Article | 25 September 2010 Paper

Photomask Japan 2010 panel discussion overview

Yoshinori Nagaoka, Hiroshi Mohri, Shinji Akima

Proceedings Volume 7823, 782306 (2010) https://doi.org/10.1117/12.868534

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Proceedings Article | 11 May 2009 Paper

Evaluation of mask data format standard OASIS.MASK developed for mask tools

Toshio Suzuki, Yoshinori Nagaoka, Yumiko Maenaka, Venu Vellanki, Wayne Ruch, Masayoshi Mori, Keiko Hattori, Kunihiro Hosono, Shogo Narukawa, Morihisa Hoga, Hiroshi Mohri

Proceedings Volume 7379, 737931 (2009) https://doi.org/10.1117/12.824351

KEYWORDS: Data conversion, Inspection, Photomasks, Data storage servers, Standards development, Vestigial sideband modulation, Data storage, Metals, Metrology, Printing

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Proceedings Article | 30 October 2007 Paper

PMJ 2007 panel discussion overview: double exposure and double patterning for 32-nm half-pitch design node

Yoshinori Nagaoka, Hidehiro Watanabe

Proceedings Volume 6730, 673006 (2007) https://doi.org/10.1117/12.752596

KEYWORDS: Double patterning technology, Photomasks, Lithography, Computer aided design, Binary data, Scanners, Printing, Overlay metrology, Manufacturing, Immersion lithography

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Proceedings Article | 20 August 2004 Paper

Evaluation of mask quality control methods addressing progressive haze issues

Kaustuve Bhattacharyya, Christopher Aquino, William Volk, Norihiko Takatsu, Takao Konishi, Yoshinori Nagaoka

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557730

KEYWORDS: Photomasks, Inspection, Reticles, Crystals, Air contamination, Defect detection, Semiconducting wafers, Image quality, Wafer inspection, Deep ultraviolet

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Proceedings Article | 27 December 2002 Paper

PMJ 2002 Panel Discussion Review: Lithography strategy from 90- to 65-nm nodes -- ArF, F2, or EPL?

Hiroyoshi Tanabe, Yoshinori Nagaoka

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467903

KEYWORDS: Lithography, Photomasks, Pellicles, Scanners, Phase shifts, Transmittance, Mask making, Semiconducting wafers, Extreme ultraviolet, Particles

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Showing 5 of 7 publications

Conference Committee Involvement (5)

Photomask and Next Generation Lithography Mask Technology XIV

17 April 2007 | Yokohama, Japan

Photomask and Next-Generation Lithography Mask Technology XIII

18 April 2006 | Yokohama, Japan

Photomask and Next-Generation Lithography Mask Technology XII

13 April 2005 | Yokohama, Japan

Photomask and Next-Generation Lithography Mask Technology XI

14 April 2004 | Yokohama, Japan

Photomask and NGL Mask Technology X

16 April 2003 | Yokohama, Japan

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