Dr. Yosuke Honda Profile

Dr. Yosuke Honda

at High Energy Accelerator Research Organization KEK

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 26 August 2024 Paper

Research and development of the EUV-FEL light source for lithography

Norio Nakamura, Ryukou Kato, Hiroshi Sakai, Kimichika Tsuchiya, Yoshinori Tanimoto, Yosuke Honda, Miho Shimada, Masahiro Yamamoto, Takanori Tanikawa, Olga Tanaka, Takashi Obina, Shinichiro Michizono, Hiroshi Kawata

Proceedings Volume 13177, 131770L (2024) https://doi.org/10.1117/12.3033966

KEYWORDS: Free electron lasers, Light sources, Lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Power consumption, Polarization, Polarization control, Scanners, Tin

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Proceedings Article | 13 June 2022 Poster + Presentation

Construction and commissioning of cERL IR-FEL for realizing the EUV-FEL for future lithography

Norio Nakamura, Ryukou Kato, Hiroshi Sakai, Kimichika Tsuchiya, Yasunori Tanimoto, Yosuke Honda, Tsukasa Miyajima, Miho Shimada, Takashi Obina, Hiroshi Kawata

Proceedings Volume PC12051, PC120510S (2022) https://doi.org/10.1117/12.2613617

KEYWORDS: Lithography, Free electron lasers, Extreme ultraviolet, Stochastic processes, Physics, Optical resonators, Machine learning, Light sources, Laser development, Infrared radiation

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Proceedings Article | 30 September 2021 Presentation

Demonstration of proof of concept of the EUV-FEL for future lithography

Norio Nakamura, Ryokou Kato, Hiroshi Sakai, Kimichika Tsuchiya, Yasunori Tanimoto, Yosuke Honda, Tsukasa Miyajima, Miho Shimada, Takashi Obina, Hiroshi Kawata

Proceedings Volume 11854, 118540M (2021) https://doi.org/10.1117/12.2600782

KEYWORDS: Free electron lasers, Lithography, Light sources, Extreme ultraviolet, Optical simulations, Laser development, Extreme ultraviolet lithography, Continuous wave operation, Stochastic processes, Scanners

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Proceedings Article | 20 September 2020 Presentation

Achievement of an important milestone to realize the EUV-FEL high power light source for future lithograph

Ryukou Kato, Hiroshi Sakai, Kimichika Tsuchiya, Yasunori Tanimoto, Yosuke Honda, Tsukasa Miyajima, Miho Shimada, Norio Nakamura, Hiroshi Kawata

Proceedings Volume 11517, 115170R (2020) https://doi.org/10.1117/12.2573121

KEYWORDS: Light sources, Free electron lasers, Extreme ultraviolet lithography, Mid-IR, Photomask technology, Extreme ultraviolet, Stochastic processes, Electron beams, Mirrors, Magnetism

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