Youngtag Woo
at ASML
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 9 April 2024 Presentation + Paper
Proceedings Volume 12956, 129560I (2024) https://doi.org/10.1117/12.3011818
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Optical lithography, Photons, Electrons, 2D materials, Field effect transistors, Direct write lithography, Advanced patterning

Proceedings Article | 16 March 2016 Paper
Proceedings Volume 9781, 97810B (2016) https://doi.org/10.1117/12.2219358
KEYWORDS: Photomasks, Manufacturing, Lithography, Double patterning technology, Metals, Image classification, Library classification systems, Design for manufacturing, Design for manufacturability, Overlay metrology, Optical proximity correction, 193nm lithography

Proceedings Article | 18 March 2015 Paper
Yan Wang, Ryoung-Han Kim, Lei Yuan, Anindarupa Chunder, Chenchen Wang, Jia Zeng, Youngtag Woo, Jongwook Kye
Proceedings Volume 9426, 94260J (2015) https://doi.org/10.1117/12.2085716
KEYWORDS: Photomasks, Metals, Extreme ultraviolet, Optical lithography, EUV optics, Electron beam lithography, Lithography, Logic, Double patterning technology, Optical proximity correction

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