Mr. Youngtag Woo Profile

Youngtag Woo

at ASML

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Publications (3)

Proceedings Article | 9 April 2024 Presentation + Paper

Advanced EUV patterning of 2D TMDs for CMOS integration

Vina Faramarzi, Etienne de Poortere, Syam Parayil Venugopalan, Pieter Woltgens, Youngtag Woo, Mark van de Kerkhof, Pawan Kumar, Henry Medina Silva, Pierre Morin, Inge Asselberghs, Chelsey Dorow, Kevin O'Brien, Kirby Maxey, Uygar Avci

Proceedings Volume 12956, 129560I (2024) https://doi.org/10.1117/12.3011818

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Optical lithography, Photons, Electrons, 2D materials, Field effect transistors, Direct write lithography, Advanced patterning

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Proceedings Article | 16 March 2016 Paper

Optimization of self-aligned double patterning (SADP)-compliant layout designs using pattern matching for 10nm technology nodes and beyond

Lynn Wang, Uwe Paul Schroeder, Youngtag Woo, Jia Zeng, Sriram Madhavan, Luigi Capodieci

Proceedings Volume 9781, 97810B (2016) https://doi.org/10.1117/12.2219358

KEYWORDS: Photomasks, Manufacturing, Lithography, Double patterning technology, Metals, Image classification, Library classification systems, Design for manufacturing, Design for manufacturability, Overlay metrology, Optical proximity correction, 193nm lithography

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Proceedings Article | 18 March 2015 Paper

Study of cut mask lithography options for sub-20nm metal routing

Yan Wang, Ryoung-Han Kim, Lei Yuan, Anindarupa Chunder, Chenchen Wang, Jia Zeng, Youngtag Woo, Jongwook Kye

Proceedings Volume 9426, 94260J (2015) https://doi.org/10.1117/12.2085716

KEYWORDS: Photomasks, Metals, Extreme ultraviolet, Optical lithography, EUV optics, Electron beam lithography, Lithography, Logic, Double patterning technology, Optical proximity correction

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