Dr. Yu-Cheng Tsai
at ASML
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 16 October 2017 Presentation + Paper
Tae Kwon Jee, Vadim Timoshkov, Peter Choi, David Rio, Yu-Cheng Tsai, Hidetami Yaegashi, Kyohei Koike, Carlos Fonseca, Stijn Schoofs
Proceedings Volume 10450, 1045017 (2017) https://doi.org/10.1117/12.2281627
KEYWORDS: Etching, Optical proximity correction, Stochastic processes, Critical dimension metrology, Extreme ultraviolet, Metrology, Photoresist processing, Performance modeling, Error analysis

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