Ms. Yu-juan Liu Profile

Yu-juan Liu

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Proceedings Article | 4 April 2023 Paper

Theoretical analysis on the influence of fringe density error on varied-line-spacing grating patterned with scanning beam interference lithography

Ying Song, Ning Zhang, Yujuan Liu, Yanda Liu

Proceedings Volume 12617, 126175Q (2023) https://doi.org/10.1117/12.2666593

KEYWORDS: Error analysis, Lithography, Fringe analysis, Phase compensation, Mathematical modeling, Optics, Fabrication, Diffraction gratings

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Interference fringe density is an important parameter to be precisely measured and regulated for patterning varied-line-spacing gratings with scanning beam interference lithography. The impacts of the interference fringe density error on grating parameters and exposure performance must be fully analyzed in theory to guide system design and varied-line-spacing grating fabrication. In this paper, a mathematical model of the total exposure dose for varied-line-spacing grating fabrication with scanning beam interference lithography is established. Based on the model, the calculation methods of grating parameters and exposure contrast are presented. The impacts of the fringe density error on grating parameters and exposure performance are analyzed. According to the requirements of grating application and manufacturing process, the error threshold and susceptible parameters are determined. The improvement effect from the step size of stage on error threshold is discussed. The results of a typical grating show that the interference fringe density error leads to the grating performance and exposure contrast degradation. With the fringe density relative error of 0.001, the relative errors of the grating groove density coefficients can be controlled in the order of 10^-8 and 10^-6, respectively. The ghost line intensity and exposure contrast have higher requirements on fringe density error. Under the same conditions, to obtain a ghost line intensity smaller than 1×10^-3 and an exposure contrast better than 0.9, the error threshold should be smaller than 1.7×10^-4 and 7×10^-4, respectively. A smaller step size of stage can significantly improve the ghost line intensity, and the fringe density error threshold can be relaxed at the expense of production efficiency. The error threshold calculation and error relaxation methods provide a theoretical basis for system design.

Proceedings Article | 31 January 2023 Paper

Research on near infrared spectroscopy based on DMD

Yu-juan Liu, Yan-da Liu, Ying Song

Proceedings Volume 12505, 125050M (2023) https://doi.org/10.1117/12.2664753

KEYWORDS: Digital micromirror devices, Spectroscopy, Near infrared, Infrared spectroscopy, Technology, Near infrared spectroscopy, Equipment, Signal to noise ratio, Analytical research, Micromirrors

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Near infrared spectroscopy has been applied to qualitative and quantitative analysis in many fields due to its advantages of fast measurement speed, high accuracy and continuous measurement. Digital micromirror array is an electronic input and output optical mems, semiconductor manufacturing technology combined with the height of the integrated circuit manufacturing technology, make its in resolution, contrast, brightness, grayscale, color fidelity and main performance parameters, such as response time reached the high level, high reliability, fast response speed. In recent years, near-infrared spectroscopy based on wavelength grating and modulation characteristics of DMD has become a research hotspot. This system has the advantages of high signal-to-noise ratio, excellent comprehensive performance and low cost, and has attracted much attention in many application fields. In this paper, the principle, development history, application status and development direction of near infrared spectroscopy based on DMD are reviewed, which provides a basis for the related research of DMD near infrared spectroscopy analysis technology.

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