CONFERENCE PROCEEDINGS
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Yuki Furukawa
at Nissan Chemical Corp
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Author
Publications (4)
Proceedings Article | 10 April 2024 Presentation
Organic dry development rinse (O-DDR) process for MOR patterning toward high-NA EUV
Satoshi Takeda, Wataru Shibayama, Rikimaru Sakamoto, Syuhei Shigaki, Yuki Furukawa, Taiki Saijo, Kodai Kato, Seonggil Heo, Hyo Seon Suh
Proceedings Volume 12957, 1295702 (2024) https://doi.org/10.1117/12.3010078
KEYWORDS: Optical lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Capillaries, Metal oxides, Liquids, Dry etching, Materials processing
Proceedings Article | 9 April 2024 Presentation + Paper
Enhancement of sensitivity and resolution by functional surface treatment process and primers (FSTP)
Wataru Shibayama, Shuhei Shigaki, Satoshi Takeda, Kodai Kato, Yuki Furukawa, Taiki Saijo, Makoto Nakajima, Rikimaru Sakamoto
Proceedings Volume 12957, 1295716 (2024) https://doi.org/10.1117/12.3011014
KEYWORDS: Extreme ultraviolet, Optical lithography, Film thickness, Extreme ultraviolet lithography, Etching, Coating, Chemical vapor deposition, Windows, Surface roughness, Lithography
Proceedings Article | 22 November 2023 Presentation
Organic dry development rinse (O-DDR) process for MOR patterning toward high-NA EUV
Satoshi Takeda, Wataru Shibayama, Kodai Kato, Shuhei Shigaki, Yuki Furukawa, Taiki Saijo, Makoto Nakajima, Rikimaru Sakamoto
Proceedings Volume PC12750, PC1275006 (2023) https://doi.org/10.1117/12.2684973
KEYWORDS: Optical lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Capillaries, Polymers, Metal oxides, Materials processing, Liquids, Dry etching
Proceedings Article | 22 November 2023 Poster
Functional surface treatment process and primers for extremely enhancing EUVL performance
Taiki Saijo, Yuki Furukawa, Shuhei Shigaki, Satoshi Takeda, Wataru Shibayama, Makoto Nakajima, Rikimaru Sakamoto, Kodai Kato
Proceedings Volume PC12750, PC127500T (2023) https://doi.org/10.1117/12.2687489
KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Etching, Chemical vapor deposition, Windows, Tin, Silica, Optical lithography, Lithography, Coating
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