Prof. Yun Kyeong Jang Profile

Prof. Yun Kyeong Jang

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 1 April 2009 Paper

Advanced immersion contact hole patterning for sub 40nm memory applications: a fundamental resist study

Yun-Kyeong Jang, Jin-Young Yoon, Shi-Yong Lee, Kwang-Sub Yoon, Seok-Hwan Oh, Seong-Woon Choi, Woo-Sung Han, Seokho Kang, Thomas Penniman, Duk-Soo Kim, Dong Won Chung, Sung-Seo Cho, Cheng Bai Xu, George Barclay

Proceedings Volume 7273, 727339 (2009) https://doi.org/10.1117/12.814483

KEYWORDS: Diffusion, Polymers, Electroluminescence, Optical lithography, Photoresist materials, Lithography, Electronics, Image compression, Temperature metrology, Resolution enhancement technologies

Read Abstract +

Proceedings Article | 4 December 2008 Paper

Practical requirement for reflectivity control in sub 30nm device using high NA immersion lithography

Yun-kyeong Jang, So-ra Han, Hyoung-hee kim, Jin-Young Yoon, Shi-yong Lee, Kwang-sub Yoon, Seok-hwan Oh, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 7140, 714032 (2008) https://doi.org/10.1117/12.804671

KEYWORDS: Reflectivity, Lithography, Critical dimension metrology, Line width roughness, Immersion lithography, Optical lithography, Photomasks, Scanning electron microscopy, Electroluminescence, Control systems

Read Abstract +

Proceedings Article | 27 March 2007 Paper

Virtual OPC at hyper NA lithography

Sook Lee, Sang-Wook Kim, Yong-Jin Chun, Sung-Soo Suh, Yun-Kyeong Jang, Suk-Joo Lee, Sung-Woon Choi, Woo-Sung Han

Proceedings Volume 6520, 65203X (2007) https://doi.org/10.1117/12.711827

KEYWORDS: Optical proximity correction, Binary data, Photomasks, Chromium, Lithography, Data modeling, Computer simulations, Virtual reality, Scanners, Calibration

Read Abstract +

Proceedings Article | 29 March 2006 Paper

Spin-on hard mask with dual-BARC property for 50-nm devices

Jung Hwan Hah, Yun Sook Chae, Yun-Kyeong Jang, Manhyoung Ryoo, Sang-Jun Choi, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 6153, 61530L (2006) https://doi.org/10.1117/12.656075

KEYWORDS: Etching, Chemical vapor deposition, Photomasks, System on a chip, Lithography, Optical properties, Carbon, Silicon, Semiconductors, Immersion lithography

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years