Dr. Yutaka Nagata Profile

Dr. Yutaka Nagata

at RIKEN

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 13 July 2017 Paper

Observation of EUVL mask using coherent EUV scatterometry microscope with high-harmonic-generation EUV source

Daiki Mamezaki, Tetsuo Harada, Yutaka Nagata, Takeo Watanabe

Proceedings Volume 10454, 1045413 (2017) https://doi.org/10.1117/12.2275400

KEYWORDS: Extreme ultraviolet, Photomasks, Diffraction, Extreme ultraviolet lithography, Microscopes, Phase shift keying, CCD cameras, Mirrors, Scatterometry, Charge-coupled devices

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Proceedings Article | 9 July 2015 Paper

EUV mask observations using a coherent EUV scatterometry microscope with a high-harmonic-generation source

Takahiro Fujino, Yusuke Tanaka, Tetsuo Harada, Yutaka Nagata, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 9658, 965818 (2015) https://doi.org/10.1117/12.2194253

KEYWORDS: Extreme ultraviolet, Diffraction, Photomasks, Mirrors, Extreme ultraviolet lithography, Microscopes, 3D metrology, CCD cameras, Relays, Scatterometry

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Proceedings Article | 30 September 2013 Paper

Development of coherent EUV scatterometry microscope with high-order harmonic for EUV mask inspection

Yutaka Nagata, Tetsuo Harada, Masato Nakasuji, Hiroo Kinoshita, Katsumi Midorikawa

Proceedings Volume 8849, 884914 (2013) https://doi.org/10.1117/12.2023880

KEYWORDS: Diffraction, Extreme ultraviolet, Photomasks, Inspection, Extreme ultraviolet lithography, Light sources, Mirrors, Scatterometry, Microscopes, Pulsed laser operation

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Proceedings Article | 28 June 2013 Paper

Phase imaging of EUV masks using a lensless EUV microscope

Tetsuo Harada, Masato Nakasuji, Yutaka Nagata, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 8701, 870119 (2013) https://doi.org/10.1117/12.2027283

KEYWORDS: Extreme ultraviolet, Photomasks, Diffraction, Microscopes, Extreme ultraviolet lithography, CCD cameras, Phase imaging, Mirrors, Lithography, Coherence imaging

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Proceedings Article | 30 June 2012 Paper

Development of standalone coherent EUV scatterometry microscope with high-harmonic-generation EUV source

Tetsuo Harada, Masato Nakasuji, Takeo Watanabe, Yutaka Nagata, Hiroo Kinoshita

Proceedings Volume 8441, 84411I (2012) https://doi.org/10.1117/12.952477

KEYWORDS: Extreme ultraviolet, Diffraction, Mirrors, CCD cameras, Microscopes, Extreme ultraviolet lithography, Photomasks, Scatterometry, Zirconium, Optical filters

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Proceedings Article | 22 April 2011 Paper

The coherent EUV scatterometry microscope for actinic mask inspection and metrology

Tetsuo Harada, Masato Nakasuji, Teruhiko Kimura, Yutaka Nagata, Takeo Watanabe, Hiroo Kinoshita

Proceedings Volume 8081, 80810K (2011) https://doi.org/10.1117/12.896576

KEYWORDS: Photomasks, Extreme ultraviolet, Diffraction, Inspection, Extreme ultraviolet lithography, CCD cameras, Microscopes, Scatterometry, Metrology, Mirrors

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Proceedings Article | 31 August 2005 Paper

Single-shot measurement of the spatial coherence of 13-nm high-order harmonics

Yutaka Nagata, Kentaro Furusawa, Yasuo Nabekawa, Katsumi Midorikawa

Proceedings Volume 5918, 59180L (2005) https://doi.org/10.1117/12.616303

KEYWORDS: Visibility, Mirrors, Extreme ultraviolet, Spatial coherence, Reflectivity, Light sources, Pulsed laser operation, Silicon carbide, CCD cameras, High harmonic generation

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Proceedings Article | 12 December 2001 Paper

Highly coherent high-energy high-order harmonic generation

Katsumi Midorikawa, Eiji Takahashi, Yusake Tamaki, Yutaka Nagata, Yasuo Nabekawa

Proceedings Volume 4505, (2001) https://doi.org/10.1117/12.450590

KEYWORDS: High harmonic generation, Spectroscopy, Visibility, X-rays, Argon, Extreme ultraviolet, Sapphire lasers, Laser systems engineering, Pulsed laser operation, Optical amplifiers

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