Dr. Ziad el Otell Profile

Dr. Ziad el Otell

at Lam Research Corp

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Author

Publications (7)

Proceedings Article | 25 March 2016 Paper

Spin-on-carbon hard masks utilising fullerene derivatives

Alan Brown, Andreas Frommhold, Tom Lada, J. Bowen, Z. el Otell, Alex P. Robinson

Proceedings Volume 9779, 977927 (2016) https://doi.org/10.1117/12.2219212

KEYWORDS: Etching, Photomasks, Carbon, Fullerenes, Resistance, Silicon, Plasma etching, Silicon films, Plasma, System on a chip

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Proceedings Article | 20 March 2015 Paper

Impact of sequential infiltration synthesis on pattern fidelity of DSA lines

Arjun Singh, Werner Knaepen, Safak Sayan, Ziad el Otell, Boon Teik Chan, Jan Maes, Roel Gronheid

Proceedings Volume 9425, 94250N (2015) https://doi.org/10.1117/12.2086091

KEYWORDS: Polymers, Plasma etching, Atomic layer deposition, Picosecond phenomena, Etching, Line edge roughness, Polymethylmethacrylate, Plasma, Polymer thin films, Directed self assembly

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Proceedings Article | 20 March 2015 Paper

Tailored molecular glass resists for scanning probe lithography

Christian Neuber, Hans-Werner Schmidt, Peter Strohriegl, Andreas Ringk, Tristan Kolb, Andreas Schedl, Vincent Fokkema, Marijn G. van Veghel, Mike Cooke, Colin Rawlings, Urs Dürig, Armin Knoll, Jean- François de Marneffe, Ziad el Otell, Marcus Kaestner, Yana Krivoshapkina, Matthias Budden, Ivo Rangelow

Proceedings Volume 9425, 94250E (2015) https://doi.org/10.1117/12.2085734

KEYWORDS: Glasses, Scanning probe lithography, Etching, Thin films, Optical lithography, Plasma etching, Resistance, Electron beam lithography, Lithography, Crystals

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Proceedings Article | 17 March 2015 Paper

Molecular glass resist performance for nano-pattern transfer

Ziad el Otell, Andreas Ringk, Tristan Kolb, Christian Neuber, Leander Hansel, Jean-François de Marneffe

Proceedings Volume 9428, 94280J (2015) https://doi.org/10.1117/12.2085828

KEYWORDS: Etching, Glasses, Surface roughness, Refractive index, Plasma, Optical lithography, Scanning probe lithography, Atomic force microscopy, Photoresist materials, Lithography

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Proceedings Article | 17 March 2015 Paper

H2 plasma and neutral beam treatment of EUV photoresist

P. De Schepper, D. Marinov, Z. el Otell, E. Altamirano-Sánchez, J.-F. de Marneffe, S. De Gendt, N. St. J. Braithwaite

Proceedings Volume 9428, 94280C (2015) https://doi.org/10.1117/12.2085679

KEYWORDS: Plasma, Photoresist materials, Extreme ultraviolet lithography, Vacuum ultraviolet, Electrodes, Infrared spectroscopy, Surface roughness, Absorption, Hydrogen, FT-IR spectroscopy

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SPIE Journal Paper | 19 May 2014

Line edge and width roughness smoothing by plasma treatment

Peter De Schepper, Terje Hansen, Efrain Altamirano-Sanchez, Alessandro Pret, Ziad el Otell, Werner Boulart, Stefan De Gendt

JM3, Vol. 13, Issue 02, 023006, (May 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.2.023006

KEYWORDS: Plasma, Photoresist materials, Plasma treatment, Vacuum ultraviolet, Line width roughness, Photons, Polymers, Optical filters, Extreme ultraviolet lithography, Extreme ultraviolet

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Proceedings Article | 28 March 2014 Paper

Hydrogen plasma treatment: the evolution of roughness in frequency domain

P. De Schepper, A. Vaglio Pret, E. Altamirano-Sánchez, Z. el Otell, S. De Gendt

Proceedings Volume 9054, 90540C (2014) https://doi.org/10.1117/12.2046299

KEYWORDS: Plasma, Semiconducting wafers, Line width roughness, Plasma treatment, Lithography, Extreme ultraviolet lithography, Line edge roughness, Hydrogen, Neodymium, Vacuum ultraviolet

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Showing 5 of 7 publications

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