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Zoe Hong
Engineer at Tokyo Electron Taiwan Ltd
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Author
Publications (1)
Proceedings Article | 31 March 2010 Paper
Productivity improvement in the wafer bevel and backside cleaning before exposure
Yoichi Tokunaga, Shuuichi Nishikido, Kousuke Yoshihara, Zoe Hong, Marlene Strobl, Yu Lin
Proceedings Volume 7639, 763924 (2010) https://doi.org/10.1117/12.846488
KEYWORDS: Semiconducting wafers, Particles, Photoresist processing, Contamination, Image processing, Immersion lithography, Coating, Thin film coatings, Optical lithography, Head-mounted displays
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