Dr. Tatsuya Ariga Profile

Dr. Tatsuya Ariga

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Publications (22)

Proceedings Article | 26 April 2007 Paper

Development of a short pulse and high average power CO2 laser for EUV lithography

Tatsuya Ariga

Proceedings Volume 6346, 634604 (2007) https://doi.org/10.1117/12.738798

KEYWORDS: Gas lasers, Carbon monoxide, Pulsed laser operation, Extreme ultraviolet, Laser systems engineering, Extreme ultraviolet lithography, Oscillators, Tin, Optical amplifiers, Light sources

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Proceedings Article | 21 March 2007 Paper

Characterization of various Sn targets with respect to debris and fast ion generation

Yoshifumi Ueno, Hideo Hoshino, Tatsuya Ariga, Taisuke Miura, Masaki Nakano, Hiroshi Komori, Georg Soumagne, Akira Endo, Hakaru Mizoguchi, Akira Sumitani, Koichi Toyoda

Proceedings Volume 6517, 65173B (2007) https://doi.org/10.1117/12.711226

KEYWORDS: Tin, Gas lasers, Ions, Plasma, Carbon monoxide, Nd:YAG lasers, Extreme ultraviolet, Glasses, Solids, Mirrors

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Proceedings Article | 19 March 2007 Paper

Laser-produced EUV light source development for HVM

Akira Endo, Hideo Hoshino, Takashi Suganuma, Masato Moriya, Tatsuya Ariga, Yoshifumi Ueno, Masaki Nakano, Takeshi Asayama, Tamotsu Abe, Hiroshi Komori, Georg Soumagne, Hakaru Mizoguchi, Akira Sumitani, Koichi Toyoda

Proceedings Volume 6517, 65170O (2007) https://doi.org/10.1117/12.711097

KEYWORDS: Gas lasers, Carbon monoxide, Tin, Extreme ultraviolet, Plasma, Pulsed laser operation, Nd:YAG lasers, Light sources, Optical amplifiers, Ions

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Proceedings Article | 14 February 2007 Paper

High average power CO2 laser MOPA system for Tin target LPP EUV light source

Tatsuya Ariga, Hideo Hoshino, Akira Endo

Proceedings Volume 6454, 645403 (2007) https://doi.org/10.1117/12.698091

KEYWORDS: Gas lasers, Pulsed laser operation, Carbon monoxide, Extreme ultraviolet, Laser systems engineering, Tin, Light sources, Oscillators, Optical amplifiers, Extreme ultraviolet lithography

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Proceedings Article | 24 March 2006 Paper

High-power pulsed CO₂ laser for EUV lithography

Tatsuya Ariga, Hideo Hoshino, Taisuke Miura, Akira Endo

Proceedings Volume 6151, 61513M (2006) https://doi.org/10.1117/12.656804

KEYWORDS: Gas lasers, Pulsed laser operation, Carbon monoxide, Laser systems engineering, Extreme ultraviolet, Xenon, Plasma, Optical amplifiers, Oscillators, Amplifiers

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Proceedings Article | 23 March 2006 Paper

Development of CO₂ laser produced Xe plasma EUV light source for microlithography

Hakaru Mizoguchi, Akira Endo, Tatsuya Ariga, Taisuke Miura, Hideo Hoshino, Yoshifumi Ueno, Masaki Nakano, Hiroshi Komori, Akira Sumitani, Tamotsu Abe, Takashi Suganuma, Georg Soumagne, Hiroshi Someya, Yuichi Takabayashi, Koichi Toyoda

Proceedings Volume 6151, 61510S (2006) https://doi.org/10.1117/12.656941

KEYWORDS: Gas lasers, Carbon monoxide, Plasma, Pulsed laser operation, Xenon, Extreme ultraviolet, Ions, Magnetism, Laser irradiation, Oscillators

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Proceedings Article | 23 February 2006 Paper

High power and short pulse RF-excited CO₂ laser MOPA system for LLP EUV light source

Tatsuya Ariga, Hideo Hoshino, Taisuke Miura, Akira Endo

Proceedings Volume 6101, 61011N (2006) https://doi.org/10.1117/12.645607

KEYWORDS: Gas lasers, Pulsed laser operation, Carbon monoxide, Extreme ultraviolet, Laser systems engineering, Optical amplifiers, Xenon, Plasma, Oscillators, Continuous wave operation

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Proceedings Article | 31 August 2005 Paper

EUV characteristics of a high power and high repetition rate CO2 laser driven Xe plasma

Hiroshi Komori, Yoshifumi Ueno, Hideo Hoshino, Tatsuya Ariga, Akira Endo

Proceedings Volume 5918, 59180H (2005) https://doi.org/10.1117/12.616051

KEYWORDS: Plasma, Carbon dioxide lasers, Extreme ultraviolet, Ions, Xenon, Nd:YAG lasers, Pulsed laser operation, Laser irradiation, Light sources, Mirrors

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Proceedings Article | 31 August 2005 Paper

Development of short pulse and high power CO2 laser for EUV lithography

Akira Endo, Hideo Hoshino, Tatsuya Ariga, Taisuke Miura

Proceedings Volume 5918, 59180I (2005) https://doi.org/10.1117/12.616342

KEYWORDS: Carbon dioxide lasers, Pulsed laser operation, Extreme ultraviolet, Optical amplifiers, Xenon, Plasma, Laser systems engineering, Oscillators, Continuous wave operation, Gas lasers

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Proceedings Article | 6 May 2005 Paper

Laser-produced-plasma light source for EUV lithography

Georg Soumagne, Tamotsu Abe, Takashi Suganuma, Yousuke Imai, Hiroshi Someya, Hideo Hoshino, Masaki Nakano, Hiroshi Komori, Yuichi Takabayashi, Tatsuya Ariga, Yoshifumi Ueno, Yasunori Wada, Akira Endo, Koichi Toyoda

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599333

KEYWORDS: Extreme ultraviolet, Light sources, Xenon, Laser applications, Gas lasers, Laser systems engineering, Nd:YAG lasers, Oscillators, Amplifiers, Extreme ultraviolet lithography

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Proceedings Article | 28 May 2004 Paper

Development of high-power ArF/F2 laser platform for VUV microlithography

Kouji Kakizaki, Junichi Fujimoto, Taku Yamazaki, Toru Suzuki, Takashi Matsunaga, Yasufumi Kawasuji, Yukio Watanabe, Masashi Kaminishi, Toyoharu Inoue, Hakaru Mizoguchi, Takahito Kumazaki, Tatsuya Ariga, Takayuki Watanabe, Takayuki Yabu, Koutarou Sasano, Tsukasa Hori, Osamu Wakabayashi, Akira Sumitani

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536846

KEYWORDS: High power lasers, Optical lithography, Vacuum ultraviolet, Mirrors, Lithography, Reliability, Light sources, Magnetism, Laser development

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Proceedings Article | 28 May 2004 Paper

Beam quality of a new-type MOPO laser system for VUV laser lithography

Osamu Wakabayashi, Tatsuya Ariga, Takahito Kumazaki, Koutarou Sasano, Takayuki Watanabe, Takayuki Yabu, Tsukasa Hori, Kouji Kakizaki, Akira Sumitani, Hakaru Mizoguchi

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536241

KEYWORDS: Spatial coherence, Fabry–Perot interferometers, Spectroscopy, Laser systems engineering, Lithography, Vacuum ultraviolet, Oscillators, Interferometers, Mirrors, Visibility

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ArF-dry microlithography is currently switching from pre-production to mass-production and the target node is shifted from 90 nm to 65 nm. ArF-wet or F₂ laser lithography will then be an important player for the next generation node below 45 nm. Therefore, high throughput and high-resolution exposure tools for VUV lithography require VUV light sources (ArF and F₂ lasers) with high power and narrow bandwidth. In this paper, we describe the beam quality of the new- type injection lock (MOPO, master oscillator power oscillator) ArF laser system we developed and compare it with the beam quality of a master oscillator power amplifier (MOPA) ArF laser system. A high power and narrow bandwidth ArF laser can be achieved with twin laser chambers in a MOPA or an injection lock laser configuration. Compared to the MOPA system, the injection lock laser system has an excellent performance (e.g. high efficiency, long pulse duration and narrow spectrum). On the other hand, the injection lock system has some disadvantages in beam quality showing high spatial coherence, broadband emission and having a beam profile with a hole. These technical issues have been solved, however, with the following two new breakthrough-technologies: (1) a new-type injection lock system having low spatial coherence and a beam profile with no hole and (2) the optimization of the injection seed energy and discharge timing between the twin chambers for low broadband emission. The spatial coherence, the broadband spectrum and the beam profile of the new-type injection lock system were measured with a Young’s interferometer, a wide range spectrometer with etalons and a 2-dimensional beam profiler, respectively. The new-type injection lock ArF laser system had a lower spatial coherence than a conventional injection lock system, a very low broadband emission level thus preventing deterioration of exposure tools resolution, and a beam profile with no hole. Moreover, we reconfirmed that the new-type injection lock system has the same excellent performance as the conventional injection lock system.

Proceedings Article | 10 November 2003 Paper

Development of 5 kHz ultra-line-narrowed F2 laser for dioptric projection system

Hakaru Mizoguchi, Ryoichi Nohdomi, Tatsuya Ariga, Kazuaki Hotta, Kiyoharu Nakao, Koichi Kasuya

Proceedings Volume 5120, (2003) https://doi.org/10.1117/12.515510

KEYWORDS: Oscillators, Amplifiers, Pulsed laser operation, Laser development, Refractor telescopes, Laser systems engineering, Projection systems, Spectroscopy, Resonators, Combined lens-mirror systems

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Proceedings Article | 26 June 2003 Paper

Spectral dynamics analysis of utlra-line-narrowed F2 laser

Takahito Kumazaki, Osamu Wakabayashi, Ryoichi Nohdomi, Tatsuya Ariga, Hidenori Watanabe, Kazuaki Hotta, Hakaru Mizoguchi, Hiroki Tanaka, Akihiko Takahashi, Tatsuo Okada

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485381

KEYWORDS: Pulsed laser operation, Oscillators, Optical simulations, Laser systems engineering, Laser development, Amplifiers, Numerical simulations, Optical amplifiers, Resonators, Luminescence

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Proceedings Article | 30 July 2002 Paper

Spectral metrologies for ultra-line-narrowed F2 laser

Takanori Nakaike, Osamu Wakabayashi, Toru Suzuki, Hakaru Mizoguchi, Kiyoharu Nakao, Ryoichi Nohdomi, Tatsuya Ariga, Naoki Kitatochi, Takashi Suganuma, Takahito Kumazaki, Kazuaki Hotta, Masaki Yoshioka

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474560

KEYWORDS: Spectroscopy, Vacuum ultraviolet, Laser development, Calibration, Refractor telescopes, Metrology, Light sources, Laser systems engineering, Oscillators, Optical lithography

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Proceedings Article | 30 July 2002 Paper

Development of a 5-kHz ultra-line-narrowed F2 laser for dioptric projection systems

Tatsuya Ariga, Hidenori Watanabe, Takahito Kumazaki, Naoki Kitatochi, Kotaro Sasano, Yoshifumi Ueno, Masayuki Konishi, Takashi Suganuma, Masaki Nakano, Toshio Yamashita, Toshihiro Nishisaka, Ryoichi Nohdomi, Kazuaki Hotta, Hakaru Mizoguchi, Kiyoharu Nakao

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474613

KEYWORDS: Oscillators, Pulsed laser operation, Amplifiers, Refractor telescopes, Laser development, Laser systems engineering, Projection systems, Laser stabilization, Spectroscopy, Mirrors

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Proceedings Article | 25 February 2002 Paper

Ultra-line-narrowed F2 laser for microlithography

Hiroshi Komori, Tatsuya Ariga, Hidenori Watanabe, Takahito Kumazaki, Naoki Kitatochi, Kotaro Sasano, Yoshifumi Ueno, Toshihiro Nishisaka, Ryoichi Nohdomi, Kazuaki Hotta, Hakaru Mizoguchi, Kiyoharu Nakao

Proceedings Volume 4426, (2002) https://doi.org/10.1117/12.456815

KEYWORDS: Oscillators, Laser development, Pulsed laser operation, Optical amplifiers, Laser systems engineering, Laser applications, Optical lithography, Lithography, Amplifiers, Refractor telescopes

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Proceedings Article | 14 September 2001 Paper

Challenge of the F2 laser for dioptric projection system

Tatsuya Ariga, Hidenori Watanabe, Takahito Kumazaki, Naoki Kitatochi, Kotaro Sasano, Yoshifumi Ueno, Toshihiro Nishisaka, Ryoichi Nohdomi, Kazuaki Hotta, Hakaru Mizoguchi, Kiyoharu Nakao

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435650

KEYWORDS: Oscillators, Optical amplifiers, Amplifiers, Refractor telescopes, Laser systems engineering, Laser development, Pulsed laser operation, Optical lithography, Projection systems, Combined lens-mirror systems

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Proceedings Article | 14 September 2001 Paper

Long pulse duration of F2 laser for 157-nm lithography

Hidenori Watanabe, Naoki Kitatochi, Kouji Kakizaki, Akifumi Tada, Jun Sakuma, Tatsuya Ariga, Kazuaki Hotta

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435639

KEYWORDS: Pulsed laser operation, Oscillators, Laser development, Lithography, Laser systems engineering, Electronics, Optical amplifiers, Laser applications, Reflectivity, Laser resonators

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Proceedings Article | 5 July 2000 Paper

High-NA high-throughput scanner compatible 2-kHz KrF excimer laser for DUV lithography

Hiroaki Nakarai, Naoto Hisanaga, Natsushi Suzuki, Takeshi Matsunaga, Takeshi Asayama, Jun Akita, Toru Igarashi, Tatsuya Ariga, Satoru Bushida, Tatsuo Enami, Ryoichi Nodomi, Yuichi Takabayashi, Syouich Sakanishi, Takashi Suzuki, Hitoshi Tomaru, Kiyoharu Nakao

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388987

KEYWORDS: Excimer lasers, Lithography, Electrodes, Cobalt, Laser scanners, 3D scanning, Control systems, Energy efficiency, Fluorine, Mirrors

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Proceedings Article | 26 July 1999 Paper

Performance of a highly stable 2-kHz operation KrF laser

Tatsuo Enami, Masaki Nakano, Takayuki Watanabe, Ayako Ohbo, Tsukasa Hori, Takashi Ito, Toshihiro Nishisaka, Akira Sumitani, Osamu Wakabayashi, Hakaru Mizoguchi, Hiroaki Nakarai, Naoto Hisanaga, Takeshi Matsunaga, Hirokazu Tanaka, Tatsuya Ariga, Syouich Sakanishi, Takeshi Okamoto, Ryoichi Nodomi, Takashi Suzuki, Yuichi Takabayashi, Hitoshi Tomaru, Kiyoharu Nakao

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354313

KEYWORDS: Excimer lasers, Magnetism, Pulsed laser operation, Contamination, Semiconductors, Laser applications, Laser development, Fluctuations and noise, Fabry–Perot interferometers

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Proceedings Article | 29 June 1998 Paper

High-spectral-purity and high-durability kHz KrF excimer laser with advanced rf preionization discharge

Tatsuo Enami, Osamu Wakabayashi, Toshihiro Nishisaka, Natsushi Suzuki, Takashi Nire, Hakaru Mizoguchi, Hiroaki Nakarai, Hirokazu Tanaka, Tatsuya Ariga, Kouji Shio, Takeshi Okamoto, Ryoichi Nodomi, Hitoshi Tomaru, Kiyoharu Nakao

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310733

KEYWORDS: Excimer lasers, Pulsed laser operation, Optical lithography, Halogens, Gas lasers, Lithography, Deep ultraviolet, Laser development, Solid state lasers, Reliability

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Showing 5 of 22 publications

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