Artwork Mask Generation Of Convex/Concave Regions

Larry Widigen

doi:10.1117/12.954829

20 September 1976 Artwork Mask Generation Of Convex/Concave Regions

Larry Widigen

Proceedings Volume 0080, Developments in Semiconductor Microlithography; (1976) https://doi.org/10.1117/12.954829
Event: Developments in Semiconductor Microlithography, 1976, San Jose, CA, United States

Abstract

The geometries of semiconductor photomasks often incorporate complex regions in the definition of diffusion windows. This paper presents a technique for the computer generation of the master artwork for such photomask patterns. Given the perimeter definition of a convex mask region, a general technique for filling in the region is developed. This technique is then extended to include any convex/concave shaped region. An algorithm that permits optimal photoplotter aperture selection is then introduced. Combining this algorithm with this general technique provides an effective method of automatic mask generation.

Citation Download Citation

Larry Widigen "Artwork Mask Generation Of Convex/Concave Regions", Proc. SPIE 0080, Developments in Semiconductor Microlithography, (20 September 1976); https://doi.org/10.1117/12.954829

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