The Theoretical Basis Of A New Optical Method For The Accurate Measurement Of Small Line-Widths

Richard E. Swing

doi:10.1117/12.954836

20 September 1976 The Theoretical Basis Of A New Optical Method For The Accurate Measurement Of Small Line-Widths

Richard E. Swing

Proceedings Volume 0080, Developments in Semiconductor Microlithography; (1976) https://doi.org/10.1117/12.954836
Event: Developments in Semiconductor Microlithography, 1976, San Jose, CA, United States

Abstract

As part of the effort conducted at NBS to solve some of the fundamental problems associated with width measurement of very small (l-5-µm) lines and spaces, the performance of an optical microscope with coherent illumination is investigated. From these studies, the theoretical basis for a new method of accurate width measurements is developed and explored. The new method, in effect, produces an optical transformation in which the image no longer resembles the original line but in which the location of the line-edges is marked by two narrow, dark lines within a bright surround. The correct line-width is then given by the distance between these two lines, a measurement that eliminates the orientation problems normally associated with filar eyepieces and sidesteps the coherence problem that affects shearing eyepieces. Suggestions are made about implementing the technique. Available microscope objectives are not suitable for such a system, and a redesign is recommended.

Citation Download Citation

Richard E. Swing "The Theoretical Basis Of A New Optical Method For The Accurate Measurement Of Small Line-Widths", Proc. SPIE 0080, Developments in Semiconductor Microlithography, (20 September 1976); https://doi.org/10.1117/12.954836

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