Laser-Based Studies Of Chemical Vapor Deposition

W. G. Breiland; M. E. Coltrin; Pauline Ho

doi:10.1117/12.934969

9 August 1983 Laser-Based Studies Of Chemical Vapor Deposition

W. G. Breiland, M. E. Coltrin, Pauline Ho

Proceedings Volume 0385, Laser Processing of Semiconductor Devices; (1983) https://doi.org/10.1117/12.934969
Event: 1983 Los Angeles Technical Symposium, 1983, Los Angeles, United States

Abstract

Pulsed laser-Raman spectroscopy and laser-excited fluorescence have been used to profile reactive species concentrations inside a chemical vapor deposition cell. Experimental data and theoretical calculations indicate that gas-phase chemical kinetics plays an important role in the deposition process.

Citation Download Citation

W. G. Breiland, M. E. Coltrin, and Pauline Ho "Laser-Based Studies Of Chemical Vapor Deposition", Proc. SPIE 0385, Laser Processing of Semiconductor Devices, (9 August 1983); https://doi.org/10.1117/12.934969

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