Thermal Distortion Of A Thin Low Expansion Fused Silica Mirror

John W. Pepi; William P Barnes Jr.

doi:10.1117/12.939265

5 January 1984 Thermal Distortion Of A Thin Low Expansion Fused Silica Mirror

John W. Pepi, William P Barnes Jr.

Proceedings Volume 0450, Structural Mechanics of Optical Systems I; (1984) https://doi.org/10.1117/12.939265
Event: 1983 Cambridge Symposium, 1983, Cambridge, United States

Abstract

To meet the demands of a fraction of a wavelength of light residual error imposed by high resolution optical systems, detailed analytical modeling techniques are required. For large lightweight, optical elements, errors can be significant even in a relatively benign thermal environment with materials exhibiting near zero coefficient of thermal expansion (CTE). This study evaluates a thin, circular, spherical mirror made of Corning Glass Works Ultra Low Expansion (ULE) fused silica glass, subjected to thermal loading. To validate performance characteristics, a detailed finite element mathematical model is made, utilizing the NASTRAN digital routine. Included are typical Corning measured values of CTE, which vary positively and negatively within the mirror about a near zero nominal value. NASTRAN results under thermal soak and linear gradient conditions are com-pared to a theoretical solution of a partial shell under uniform axial thermal gradient.

Citation Download Citation

John W. Pepi and William P Barnes Jr. "Thermal Distortion Of A Thin Low Expansion Fused Silica Mirror", Proc. SPIE 0450, Structural Mechanics of Optical Systems I, (5 January 1984); https://doi.org/10.1117/12.939265

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