Paper
21 August 1987 The Density Of States In Hydrogenated Amorphous Silicon
R. A. Street
Author Affiliations +
Proceedings Volume 0763, Physics of Amorphous Semiconductor Devices; (1987) https://doi.org/10.1117/12.940153
Event: OE LASE'87 and EO Imaging Symposium, 1987, Los Angeles, CA, United States
Abstract
This paper reviews various experiments that give information about the density of states in hydrogenated amorphous silicon (a-Si:H). The data are used to construct the density of states distribution N(E), and its dependence on doping. The structural origin of the different groups of states is discussed, and it is also shown that N(E) depends on the thermal history of the samples.
© (1987) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
R. A. Street "The Density Of States In Hydrogenated Amorphous Silicon", Proc. SPIE 0763, Physics of Amorphous Semiconductor Devices, (21 August 1987); https://doi.org/10.1117/12.940153
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Cited by 9 scholarly publications.
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KEYWORDS
Electrons

Doping

Absorption

Arsenic

Phosphorus

Amorphous semiconductors

Physics

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