Advances In 1:1 Optical Lithography

Adonis C. Stephanakis; Daniel I. Rubin; Ron Voisin

doi:10.1117/12.975606

17 September 1987 Advances In 1:1 Optical Lithography

Adonis C. Stephanakis, Daniel I. Rubin, Ron Voisin

Proceedings Volume 0811, Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection; (1987) https://doi.org/10.1117/12.975606
Event: Fourth International Symposium on Optical and Optoelectronic Applied Sciences and Engineering, 1987, The Hague, Netherlands

Abstract

Numerous advancements based on the inherent simplicity and excellent optical correction of 1:1 broadband stepper lenses have occurred over the past year. This paper briefly touches on the lithographic requirements of various segments of the semiconductor industry and describes photolithographic developments that meet many of these requirements.

Citation Download Citation

Adonis C. Stephanakis, Daniel I. Rubin, and Ron Voisin "Advances In 1:1 Optical Lithography", Proc. SPIE 0811, Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection, (17 September 1987); https://doi.org/10.1117/12.975606

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available