Plasma Focus Device As An Unconventional Source Of High-Energy Electrons And Ions For Pumping Of Lasers

Ludwik Pokora; Janusz Wawer

doi:10.1117/12.943351

19 October 1987 Plasma Focus Device As An Unconventional Source Of High-Energy Electrons And Ions For Pumping Of Lasers

Ludwik Pokora, Janusz Wawer

Proceedings Volume 0859, Laser Technology II; (1987) https://doi.org/10.1117/12.943351
Event: Second Symposium on Laser Technology, 1987, Warsaw, Poland

Abstract

The paper presents a characteristic of plasma focus (PF) devices as new nonclassic sources of charged particles for pumping of gas lasers. The principle of operation of such a source is given and characteristics of generated charged particles are shown. Energy of particles reaches the value of SMeV at supply voltage of 20-40kV. Measure methods of the beam parameters are described and the scheme of the experimental arrangement used to determine the conditions of Ar-N2 laser pumping by ions emitted from a lkJ-PF device is presented.

Citation Download Citation

Ludwik Pokora and Janusz Wawer "Plasma Focus Device As An Unconventional Source Of High-Energy Electrons And Ions For Pumping Of Lasers", Proc. SPIE 0859, Laser Technology II, (19 October 1987); https://doi.org/10.1117/12.943351

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