In-Situ Optical Monitoring Of Thin Film Deposition

R. P. Netterfield; P. J. Martin; K. H. Muller

doi:10.1117/12.949322

10 March 1989 In-Situ Optical Monitoring Of Thin Film Deposition

R. P. Netterfield, P. J. Martin, K. H. Muller

Proceedings Volume 1012, In-Process Optical Measurements; (1989) https://doi.org/10.1117/12.949322
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany

Abstract

Real time in-situ optical measurements play a vital role in the monitoring and control of thin film deposition and etching. Techniques include single and multiwavelength monitoring of the reflectance and/or transmittance of the coating substrate, in-situ ellipsometry, and spectroscopic diagnostics of the vapour species. This paper will review these techniques and examine recent trends.

Citation Download Citation

R. P. Netterfield, P. J. Martin, and K. H. Muller "In-Situ Optical Monitoring Of Thin Film Deposition", Proc. SPIE 1012, In-Process Optical Measurements, (10 March 1989); https://doi.org/10.1117/12.949322

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