Future lithography technology

Gene Fuller

doi:10.1117/12.2284084

30 August 2017 Future lithography technology

Gene Fuller

Proceedings Volume 10321, Single Frequency Semiconductor Lasers; 1032105 (2017) https://doi.org/10.1117/12.2284084
Event: Tutorial Texts in Optical Engineering Series 1991, 1991, Bellingham, WA, United States

Abstract

Introduction-Lithography is the key enabler for semiconductor manufacturing. Future progress in circuit scaling depends on continued progress in lithography capability scaling. Lithography is once again approaching a "barrier" where existing technology does not demonstrate a clear path for continued progress. We will explore some continuities and discontinuities in lithography that promise to drive the scaling process for many years

Citation Download Citation

Gene Fuller "Future lithography technology", Proc. SPIE 10321, Single Frequency Semiconductor Lasers, 1032105 (30 August 2017); https://doi.org/10.1117/12.2284084

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