Search for multi-stack EUV pellicle membrane for EUV non-actinic mask inspection

Sung-Gyu Lee; Guk-Jin Kim; Su-Mi Hur; Hye-Keun Oh

doi:10.1117/12.2280618

16 October 2017 Search for multi-stack EUV pellicle membrane for EUV non-actinic mask inspection

Sung-Gyu Lee, Guk-Jin Kim, Su-Mi Hur, Hye-Keun Oh

Proceedings Volume 10450, International Conference on Extreme Ultraviolet Lithography 2017; 104501M (2017) https://doi.org/10.1117/12.2280618
Event: SPIE Photomask Technology and EUV Lithography, 2017, Monterey, California, United States

Abstract

The extreme-ultraviolet (EUV) mask cannot be inspected by using actinic inspection system because there is no commercial EUV actinic mask inspection system available yet. Moreover, the EUV pellicle must be removed if the EUV mask is inspected by non-actinic inspection system, so that a novel EUV pellicle membrane is required to inspect the EUV mask without EUV pellicle removal in the non-actinic inspection system. We have attempted to find an optimum combination as the multi-stack EUV pellicle membrane which can obtain not only high EUV transmission but also high deep-ultraviolet (DUV) transmission. Graphite- and silicon nitride (SiN_x)-based EUV pellicle membrane have a larger DUV intensity after passing through optics than those of silicon-based pellicle membranes. Based on these results, we believe that these multi-stack EUV pellicle membranes have high DUV transmission as well as EUV transmission and it would make better performance with respect to fidelity of through-pellicle inspection compared to well-known EUV pellicle membranes.

Citation Download Citation

Sung-Gyu Lee, Guk-Jin Kim, Su-Mi Hur, and Hye-Keun Oh "Search for multi-stack EUV pellicle membrane for EUV non-actinic mask inspection", Proc. SPIE 10450, International Conference on Extreme Ultraviolet Lithography 2017, 104501M (16 October 2017); https://doi.org/10.1117/12.2280618

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KEYWORDS

Extreme ultraviolet

Pellicles

Inspection

Deep ultraviolet

Photomasks

Silicon

Refractive index

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