Actinic review of EUV masks: challenges and achievements in delivering the perfect mask for EUV production

Dirk Hellweg; Martin Dietzel; Renzo Capelli; Conrad Wolke; Grizelda Kersteen; Markus Koch; Ralf Gehrke

doi:10.1117/12.2280689

16 October 2017 Actinic review of EUV masks: challenges and achievements in delivering the perfect mask for EUV production

Dirk Hellweg, Martin Dietzel, Renzo Capelli, Conrad Wolke, Grizelda Kersteen, Markus Koch, Ralf Gehrke

Author Affiliations +

Proceedings Volume 10451, Photomask Technology 2017; 104510J (2017) https://doi.org/10.1117/12.2280689
Event: SPIE Photomask Technology and EUV Lithography, 2017, Monterey, California, United States

Abstract

Actinic review of potential defect sites and verification of their repair is a key step in producing defect free masks. The AIMS^TM systems are the industry proven standard for this task and the AIMSTM EUV has been developed to provide this functionality for EUV masks. Thereby it closes an important gap in the EUV mask infrastructure for volume production. In this paper, we show the readiness of the AIMS^TM EUV for defect review and verification, and discuss the use of actinic aerial image metrology beyond this core application. In particular, we show measurements on mask 3D effects and the contribution of photon stochastics on wafer local CDU.

Citation Download Citation

Dirk Hellweg, Martin Dietzel, Renzo Capelli, Conrad Wolke, Grizelda Kersteen, Markus Koch, and Ralf Gehrke "Actinic review of EUV masks: challenges and achievements in delivering the perfect mask for EUV production", Proc. SPIE 10451, Photomask Technology 2017, 104510J (16 October 2017); https://doi.org/10.1117/12.2280689

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