Paper
25 May 1989 Super-High Resolution Holographic Materials For UV And XUV Applications
Gajendra Savant (Khune), Tomasz Jannson, Yong Qiao
Author Affiliations +
Proceedings Volume 1051, Practical Holography III; (1989) https://doi.org/10.1117/12.951470
Event: OE/LASE '89, 1989, Los Angeles, CA, United States
Abstract
Recent progress in UV and XUV optics has been accelerated as a result of development of new holographic materials based on graft concept. Using the new polymeric materials, holographic optical elements (HOEs) can be recorded in the visible and reconstructed in the UV and XUV region, with diffraction efficiencies higher than 95% for UV HOEs and 25% for XUV HOEs. The new series of high resolution (20,000 1/mm) and high refractive index modulation (Δn = 0.2) materials consist of extremely dense photochemical crosslinking network of hydroxyalkyl acrylate-methacrylates, hard dichromated gelatin, and transparent PVA.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Gajendra Savant (Khune), Tomasz Jannson, and Yong Qiao "Super-High Resolution Holographic Materials For UV And XUV Applications", Proc. SPIE 1051, Practical Holography III, (25 May 1989); https://doi.org/10.1117/12.951470
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Cited by 3 scholarly publications.
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KEYWORDS
Extreme ultraviolet

Holography

Ultraviolet radiation

Diffraction

Holographic optical elements

Refractive index

Modulation

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