Ultrafast dynamics of material excitation of dielectrics with ultrashort pulsed Bessel beams

C. Kalupka; T. Holtum; M. Reininghaus

doi:10.1117/12.2287337

19 February 2018 Ultrafast dynamics of material excitation of dielectrics with ultrashort pulsed Bessel beams

C. Kalupka, T. Holtum, M. Reininghaus

Proceedings Volume 10520, Laser-based Micro- and Nanoprocessing XII; 105200G (2018) https://doi.org/10.1117/12.2287337
Event: SPIE LASE, 2018, San Francisco, California, United States

Abstract

We report on the dynamics of the excitation process of dielectrics using a spatial Bessel beam intensity distribution with pulse durations below 10 ps. The generated free-electron plasma is analyzed by time-resolved transversal pump-probe shadowgraphy on a timescale up to 20 ps after initial excitation. Our measurements reveal the ultrafast generation of the free-electron plasma, which reaches a maximum after approximately 10 ps. The subsequent relaxation is comparable slow with a time constant in the range of 100 ps. We perform measurements with different pump pulse durations in the range from 0.1 ps up to 9 ps and observe that the spatial distribution of the generated free-electron plasma strongly depends on the pulse duration and pulse energy. Our results show that the spatial distribution of the free-electron plasma can be controlled by a coarse adjustment of the pulse parameters. The understanding of the correlation of the spatial energy deposition and pulse parameters is useful for a high precision and fast glass cutting process.

Citation Download Citation

C. Kalupka, T. Holtum, and M. Reininghaus "Ultrafast dynamics of material excitation of dielectrics with ultrashort pulsed Bessel beams", Proc. SPIE 10520, Laser-based Micro- and Nanoprocessing XII, 105200G (19 February 2018); https://doi.org/10.1117/12.2287337

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