Suppression of ablation by double-pulse femtosecond laser irradiation

Masaki Hashida; Shinichiro Masuno; Yuki Furukawa; Shogo Nishino; Mitsuhiro Kusaba; Shunsuke Inoue; Shuji Sakabe; Hitoshi Sakagami; Masahiro Tsukamoto

doi:10.1117/12.2291229

19 February 2018 Suppression of ablation by double-pulse femtosecond laser irradiation

Masaki Hashida, Shinichiro Masuno, Yuki Furukawa, Shogo Nishino, Mitsuhiro Kusaba, Shunsuke Inoue, Shuji Sakabe, Hitoshi Sakagami, Masahiro Tsukamoto

Author Affiliations +

Proceedings Volume 10522, Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XVIII; 105220S (2018) https://doi.org/10.1117/12.2291229
Event: SPIE LASE, 2018, San Francisco, California, United States

Abstract

We have demonstrated the suppression of ablation rate on a silicon surface irradiated by a double-pulse beam with two color laser in time delays of Δt = -900 - 900 ps. The double pulse beam consists of 810nm with 40fs pulse and 405nm with > 40fs pulse. The fundamental-pulse fluence F₈₁₀ is kept below ablation threshold (F_{th, 810nm} = 0.190 J/cm² ) while the second harmonic pulse fluence F₄₀₅ are kept above the ablation threshold (F_{th, 405nm} = 0.050 J/cm² ). We find that ablation rate of silicon is drastically decreased at delay times of 600ps.

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Masaki Hashida, Shinichiro Masuno, Yuki Furukawa, Shogo Nishino, Mitsuhiro Kusaba, Shunsuke Inoue, Shuji Sakabe, Hitoshi Sakagami, and Masahiro Tsukamoto "Suppression of ablation by double-pulse femtosecond laser irradiation", Proc. SPIE 10522, Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XVIII, 105220S (19 February 2018); https://doi.org/10.1117/12.2291229

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