Polarization sensitivity of ordered and random antireflective surface structures in silica and spinel

J. A. Frantz; J. Selby; L. E. Busse; L. B. Shaw; I. D. Aggarwal; J. S. Sanghera

doi:10.1117/12.2289898

22 February 2018 Polarization sensitivity of ordered and random antireflective surface structures in silica and spinel

J. A. Frantz, J. Selby, L. E. Busse, L. B. Shaw, I. D. Aggarwal, J. S. Sanghera

Proceedings Volume 10528, Optical Components and Materials XV; 105281E (2018) https://doi.org/10.1117/12.2289898
Event: SPIE OPTO, 2018, San Francisco, California, United States

Abstract

Both ordered and random anti-reflective surface structures (ARSS) have been shown to increase the transmission of an optical surface to >99.9%. These structures are of great interest as an alternative to traditional thin film anti-reflection (AR) coatings for a variety of reasons. Unlike traditional AR coatings, they are patterned directly into the surface of an optic rather than deposited on its surface and are thus not prone to the delamination under thermal cycling that can occur with thin film coatings. Their laser-induced damage thresholds can also be considerably higher. In addition, they provide AR performance over a larger spectral and angular range. It has been previously demonstrated that random ARSSs in silica are remarkably insensitive to incident polarization, with nearly zero variation in transmittance with respect to polarization of the incident beam at fixed wavelength for angles of incidence up to at least 30°. In this work, we evaluate polarization sensitivity of ARSS as a function of wavelength for both random and ordered ARSS. We demonstrate that ordered ARSS is significantly more sensitive to polarization than random ARSS and explain the reason for this difference. In the case of ordered ARSS, we observe significant differences as a function of wavelength, with the transmittance of s- and p-polarized light diverging near the diffraction edge. We present results for both silica and spinel samples and discuss differences observed for these two sets of samples.

Citation Download Citation

J. A. Frantz, J. Selby, L. E. Busse, L. B. Shaw, I. D. Aggarwal, and J. S. Sanghera "Polarization sensitivity of ordered and random antireflective surface structures in silica and spinel", Proc. SPIE 10528, Optical Components and Materials XV, 105281E (22 February 2018); https://doi.org/10.1117/12.2289898

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KEYWORDS

Reflectivity

Spinel

Polarization

Transmittance

Diffraction

Silica

Thin film coatings

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