Paper
6 July 2018 E-beam generated plasma etching for developing high-reflectance mirrors for far-ultraviolet astronomical instrument applications
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Abstract
Astronomical space telescopes to study astrophysical phenomena from the far-ultraviolet (FUV) to the near infrared (NIR) will require mirror coatings with high reflectance over this entire spectral region. While coatings for the optical and NIR part of the spectrum are fairly well developed with proven performance, the FUV presents significant challenges. The U.S. Naval Research Laboratory (NRL) has developed a processing system based on an electron beam-generated plasma that provides for controlled fluorination and/or etching of surfaces with near monolayer precision and minimal changes to surface morphology. In this paper, we report recent results of samples treated in the NRL Large Area Plasma Processing System (LAPPS) where restoration of the high intrinsic reflectance in the FUV spectral range have been observed of aluminum (Al) mirrors protected with a magnesium di-fluoride (MgF2) overcoat. This paper will also extend these studies to other un-protected Al mirrors protected to demonstrate the capability of LAPPS to simultaneously etch the native oxide layer from bare Al and passivate the surface with fluorine, leading to marked enhancements in FUV reflectance. Laboratory test data and optical diagnostic techniques used to verify surface scattering and durability of selected coatings will be presented. Finally, we will discuss the scalability of the LAPPS etching process in order to realize these high-reflectivity coatings on mirror segments as large as those proposed for the Large Ultraviolet, Optical, and Infrared (LUVOIR) astronomical telescope system (1+meter class).
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Manuel A. Quijada, David R. Boris, Javier del Hoyo, Edward J. Wollack, Alexander C. Kozen, Scott Walton, and Vivek Dwivedi "E-beam generated plasma etching for developing high-reflectance mirrors for far-ultraviolet astronomical instrument applications", Proc. SPIE 10699, Space Telescopes and Instrumentation 2018: Ultraviolet to Gamma Ray, 106992X (6 July 2018); https://doi.org/10.1117/12.2314391
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Cited by 2 scholarly publications.
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KEYWORDS
Aluminum

Reflectivity

Plasma

Mirrors

Ions

Optical coatings

Etching

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