Fast local registration measurements for efficient e-beam writer qualification and correction

Klaus-Dieter Roeth; Hendrik Steigerwald; Runyuan Han; Oliver Ache; Frank Laske

doi:10.1117/12.2325627

19 September 2018 Fast local registration measurements for efficient e-beam writer qualification and correction

Klaus-Dieter Roeth, Hendrik Steigerwald, Runyuan Han, Oliver Ache, Frank Laske

Proceedings Volume 10775, 34th European Mask and Lithography Conference; 107750G (2018) https://doi.org/10.1117/12.2325627
Event: 34th European Mask and Lithography Conference, 2018, Grenoble, France

Abstract

Mask data are presented which demonstrate local registration errors that can be correlated to the writing swathes of stateof-the-art e-beam writers and multi-pass strategies, potentially leading to systematic device registration errors versus design of close to 2nm. Furthermore, error signatures for local charging and process effects are indicated by local registration measurements resulting in systematic error, also on the order of 2nm.

Citation Download Citation

Klaus-Dieter Roeth, Hendrik Steigerwald, Runyuan Han, Oliver Ache, and Frank Laske "Fast local registration measurements for efficient e-beam writer qualification and correction", Proc. SPIE 10775, 34th European Mask and Lithography Conference, 107750G (19 September 2018); https://doi.org/10.1117/12.2325627

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