|
We had developed a unique porous thin films by a special coating method1. In this technique, two dielectric materials A and B having different refractive indices nA and nB ,where nA＞nB are simultaneously deposited in vacuum on a substrate such as fused silica or optical glasses. Then the coated surface is processed in ultra-pure water which preferentially dissolves the material B. These processes result in a porous thin film
which has gradient refractive index and has the antireflection (AR) property over broad
bandwidth. The porous coating obtained by this method cannot apply depositing a multilayered dielectric thin film. We have developed a novel method. The present technique, a dielectric material D and a plastic P are simultaneously deposited in vacuum on a heated-substrate such as fused silica, ceramic or optical glasses. Then
the coated surface forms an adaptively mixed thin film ( AMTF ) with dielectric material and plastic. In this coating process, plastics partially evaporate due to the heated-substrate. The refractive index of the coated AMTF mainly decided by the mixing ratio of the dielectric material and plastic. In our samples the damage threshold was confirmed to be 115 J/cm2 at 10 ns and λ=1064 nm. The band width of AMTF with MgF2 and Teflon (AMTF: MgF2 ) was confirmed to cover from 200 to 8000 nm. This AMTF: MgF2 can be applicable not only to AR thin film, but to a high reflectance mirror and polarizer in various high intensity laser syetems.
1K.Yoshida, H.Yoshida, Y.Kato, and C.Yamanaka, Appl.Phy.Lett.47,911(1985)
|
