Investigation on the control technique of surface roughness for silicate glass

Xiang He; Lei Xie; Chao Cai; Jinyong Huang; Qing Hu; Dingyao Yan; Ping Ma

doi:10.1117/12.2504961

16 January 2019 Investigation on the control technique of surface roughness for silicate glass

Xiang He, Lei Xie, Chao Cai, Jinyong Huang, Qing Hu, Dingyao Yan, Ping Ma

Proceedings Volume 10838, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 108380M (2019) https://doi.org/10.1117/12.2504961
Event: Ninth International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT2018), 2018, Chengdu, China

Abstract

The influence of polishing parameters such as particle size, pad material and pressure on the surface roughness of glass optics were investigated and analysed. It reveals that the surface roughness will get worse with increase of the polishing particle size. The surface roughness would remain stable in a certain period of polishing pressure, but get worse with increase of the pressure beyond the period. The surface roughness is getting better when using smooth pitch polishing pad than polyurethane pad with lots of micropores. By optimizing the polishing parameters, the surface roughness of large aperture fused silica window is improved to 0.46nm before band-pass filtering and 0.084nm after band-pass filtering.

Citation Download Citation

Xiang He, Lei Xie, Chao Cai, Jinyong Huang, Qing Hu, Dingyao Yan, and Ping Ma "Investigation on the control technique of surface roughness for silicate glass", Proc. SPIE 10838, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 108380M (16 January 2019); https://doi.org/10.1117/12.2504961

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KEYWORDS

Polishing

Surface roughness

Particles

Surface finishing

Silica

Polyurethane

Chemical mechanical planarization

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