Investigation on the nonlinear relationship between relative velocity and material removal in bonnet polishing

Chenchun Shi; Yunfeng Peng; Liang Hou; Zhenzhong Wang; Yinbiao Guo; Qilin Tang; Chenlei Li; Dengling Chen

doi:10.1117/12.2506755

6 February 2019 Investigation on the nonlinear relationship between relative velocity and material removal in bonnet polishing

Chenchun Shi, Yunfeng Peng, Liang Hou, Zhenzhong Wang, Yinbiao Guo, Qilin Tang, Chenlei Li, Dengling Chen

Author Affiliations +

Proceedings Volume 10842, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology; 108420K (2019) https://doi.org/10.1117/12.2506755
Event: Ninth International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT2018), 2018, Chengdu, China

Abstract

There has been many models for material removal mechanisms of bonnet polishing (BP) based on the well-known Preston model. However, some experimental investigations have demonstrated that the relationship between process parameters and material removal are not linear at all, especially the relative velocity, which cannot be accounted explicitly by the classical model. Accordingly, in this paper, an analytical model is proposed to investigate the nonlinear relationship between relative velocity and material removal in BP based on the mutual interaction of the slurry, pad and workpiece among the BP interfaces with the micro-contact theory and the tribology theory. Good agreement between the predicted results of proposed model and the experimental data is obtained, and the nonlinear material removal with the change of relative velocity is attributed to the variation of the real contact area.

Citation Download Citation

Chenchun Shi, Yunfeng Peng, Liang Hou, Zhenzhong Wang, Yinbiao Guo, Qilin Tang, Chenlei Li, and Dengling Chen "Investigation on the nonlinear relationship between relative velocity and material removal in bonnet polishing", Proc. SPIE 10842, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology, 108420K (6 February 2019); https://doi.org/10.1117/12.2506755

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