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8 February 2019 Aging and noise characteristics studying of Low temperature preparing Mn-Co-Ni-O thin films
Yiming Yin, Wei Zhou, Jing Wu, Lin Jiang, Zhiming Huang
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Proceedings Volume 10843, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Sensing and Imaging; 108430O (2019) https://doi.org/10.1117/12.2506111
Event: Ninth International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT2018), 2018, Chengdu, China
Abstract
Mn1.56Co0.96Ni0.48O4 (MCN) thin films with 2 μm thickness were deposited on amorphous Al2O3 substrates by Radio Frequency magnetron sputtering at 450℃, films were annealed at 450℃, 600℃ and 750℃ separately. XRD test showed that MCN thin films deposited at 450℃ possess preferential orientation (400). The variable temperature resistivity test revealed the resistivity of MCN films decreases with the annealed temperature increases. Aging testing showed that films grown at 450℃ and annealed at the same temperature had moderate aging coefficient, meanwhile, the films exhibited favorable noise performance. This paper reports a method to prepare MCN thin films with moderate resistivity, favorable aging and noise characteristics at low temperature(450℃), which is expected to be integrated with the silicon process and has great significance for developing MCN thin film linear or focal plane devices.
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Yiming Yin, Wei Zhou, Jing Wu, Lin Jiang, and Zhiming Huang "Aging and noise characteristics studying of Low temperature preparing Mn-Co-Ni-O thin films", Proc. SPIE 10843, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices for Sensing and Imaging, 108430O (8 February 2019); https://doi.org/10.1117/12.2506111
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KEYWORDS
Thin films
Resistance
Sputter deposition
Thin film devices
Infrared detectors
Temperature metrology
Infrared radiation
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