New Logic State Measurement Technique For The Electron Beam Tester

A. Ito; K. Ookubo; T. Ishizuka; A. Muto; Y. Goto

doi:10.1117/12.953125

19 July 1989 New Logic State Measurement Technique For The Electron Beam Tester

A. Ito, K. Ookubo, T. Ishizuka, A. Muto, Y. Goto

Proceedings Volume 1087, Integrated Circuit Metrology, Inspection, and Process Control III; (1989) https://doi.org/10.1117/12.953125
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

A multi-stroboscopic sampling (MSS) technique was devised for logic state measurement with the electron beam tester. Electron beam pulses are shot and secondary electron signals are sampled m times each repetition period of LSI operation. In addition, an interpolated s-curve (IPS) method was introduced in the MSS technique for quantitative voltage measurement. Using this technique, the measurement time required for 1024 logic states was reduced by 1/70 compared to the stroboscopic waveform measurement technique.

Citation Download Citation

A. Ito, K. Ookubo, T. Ishizuka, A. Muto, and Y. Goto "New Logic State Measurement Technique For The Electron Beam Tester", Proc. SPIE 1087, Integrated Circuit Metrology, Inspection, and Process Control III, (19 July 1989); https://doi.org/10.1117/12.953125

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