Use Of Mask Making Technology In Producing High Quality, Low Cost Passive Optical Devices

Arto Salin

doi:10.1117/12.953181

25 July 1989 Use Of Mask Making Technology In Producing High Quality, Low Cost Passive Optical Devices

Arto Salin

Proceedings Volume 1088, Optical/Laser Microlithography II; (1989) https://doi.org/10.1117/12.953181
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

A concept of fabricating high quality optical passive components directly into mask blanks is introduced to simplify fabrication processes. The concept is demonstrated by fabricating ion-exchanged wave-guides, diffractive binary amplitude and phase coded holographic optical elements, Dammann gratings and diffraction-free beam elements.

Citation Download Citation

Arto Salin "Use Of Mask Making Technology In Producing High Quality, Low Cost Passive Optical Devices", Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); https://doi.org/10.1117/12.953181

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