Soft X-Ray Induced Chemical Reactions In Novolak Resist

Darryl W. Peters; David N. Tomes; Robert A. Grant; Richard J. West

doi:10.1117/12.968526

1 August 1989 Soft X-Ray Induced Chemical Reactions In Novolak Resist

Darryl W. Peters, David N. Tomes, Robert A. Grant, Richard J. West

Proceedings Volume 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII; (1989) https://doi.org/10.1117/12.968526
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

Soft x-ray (i.e., λ = 1.4 nm) exposed films of Olin Hunt WX242 novolak resist were analyzed by gel permeation chromatography (GPC), UV, and FTIR spectroscopy. The decrease in concentration of diazonapthaquinone (DNQ) sensitizer was determined from FTIR and UV absorption. A typical decrease in DNQ concentration of 20 to 30% was observed for a 100 mJ/cm² dose of a 1.0 μm thick film, the normal dose for soft x-ray exposure. At this exposure level, development in Olin Hunt LSI developer (5:4) required 120 seconds yielding excellent linesize control and film retention. To assist identification of chemical species produced, GPC and FTIR data from soft x-ray exposed samples were compared to those from UV exposures of 1.0 μm films in air or a vacuum.

Citation Download Citation

Darryl W. Peters, David N. Tomes, Robert A. Grant, and Richard J. West "Soft X-Ray Induced Chemical Reactions In Novolak Resist", Proc. SPIE 1089, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII, (1 August 1989); https://doi.org/10.1117/12.968526

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