Achieving diffraction-limited performance on the Berkeley MET5

Ryan Miyakawa; Chris Anderson; Wenhua Zhu; Geoff Gaines; Jeff Gamsby; Carl Cork; Gideon Jones; Michael Dickenson; Seno Rekawa; Weilun Chao; Sharon Oh; Patrick Naulleau

doi:10.1117/12.2516384

26 March 2019 Achieving diffraction-limited performance on the Berkeley MET5

Ryan Miyakawa, Chris Anderson, Wenhua Zhu, Geoff Gaines, Jeff Gamsby, Carl Cork, Gideon Jones, Michael Dickenson, Seno Rekawa, Weilun Chao, Sharon Oh, Patrick Naulleau

Author Affiliations +

Proceedings Volume 10957, Extreme Ultraviolet (EUV) Lithography X; 109571X (2019) https://doi.org/10.1117/12.2516384
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

The Berkeley MET5, funded by EUREKA, is a 0.5-NA EUV projection lithography tool located at the Advanced Light Source at Berkeley National Lab. Wavefront measurements of the MET5 optic have been performed using a custom in- situ lateral shearing interferometer suitable for high-NA interferometry. In this paper, we report on the most recent characterization of the MET5 optic demonstrating an RMS wavefront 0.31 nm, and discuss the specialized mask patterns, gratings, and illumination geometries that were employed to accommodate the many challenges associated with high-NA EUV interferometry.

Citation Download Citation

Ryan Miyakawa, Chris Anderson, Wenhua Zhu, Geoff Gaines, Jeff Gamsby, Carl Cork, Gideon Jones, Michael Dickenson, Seno Rekawa, Weilun Chao, Sharon Oh, and Patrick Naulleau "Achieving diffraction-limited performance on the Berkeley MET5", Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 109571X (26 March 2019); https://doi.org/10.1117/12.2516384

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