Application of PSD for the extraction of programmed line roughness from SAXS

Jérôme Reche; Maxime Besacier; Patrice Gergaud; Yoann Blancquaert

doi:10.1117/12.2514919

26 March 2019 Application of PSD for the extraction of programmed line roughness from SAXS

Jérôme Reche, Maxime Besacier, Patrice Gergaud, Yoann Blancquaert

Proceedings Volume 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII; 109590U (2019) https://doi.org/10.1117/12.2514919
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

For the most advanced nodes, line roughness reaches the same order of magnitude as the CD. It results in a huge impact on power consumptions and leads to some device failures. Hence, the control of this morphological aspect needs an adapted metrology. CD-SEM is considered as an adapted technique for roughness extraction. It is based on the PSD extraction that allows to obtain roughness information in frequency domain. CD-SAXS has been mentioned as one of the highest potential techniques for microelectronics by ITRS with an expected resolution better than one angstrom. The study presented in this article is based on programmed roughness simulations and first experimental measurements. It demonstrates that a complete PSD can also be extracted from a CD-SAXS analysis and that extended information of roughness can be so deduced. Comparison of SEM and SAXS proves the capability of SAXS technique for the PSD extraction of line roughness. Next challenges to improve this extraction are mentioned.

Conference Presentation

Citation Download Citation

Jérôme Reche, Maxime Besacier, Patrice Gergaud, and Yoann Blancquaert "Application of PSD for the extraction of programmed line roughness from SAXS", Proc. SPIE 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII, 109590U (26 March 2019); https://doi.org/10.1117/12.2514919

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