FEM simulation for artificial generation of SEM pictures

Duy Duc Nguyen; Jean-Herve Tortai; Patrick Schiavone

doi:10.1117/12.2515181

26 March 2019 FEM simulation for artificial generation of SEM pictures

Duy Duc Nguyen, Jean-Herve Tortai, Patrick Schiavone

Proceedings Volume 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII; 1095918 (2019) https://doi.org/10.1117/12.2515181
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

Nowadays, the accuracy of the metrology is becoming more and more a critical issue for microelectronic manufacturing as new technology nodes necessitate more and more rigorous process control. Scanning Electron Microscope (SEM) is the equipment most typically used to measure pattern dimensions. The aim of this study is to model and simulate a synthetic SEM image. This is fulfilled by taking into account the physical phenomena that take place in the sample during the scanning of the electron beam. The considered phenomena are the kinetics of the drift and the diffusion of the charges during the scanning and the secondary electrons emission from the sample into the vacuum. A system of Partial Differential Equations (PDEs) is obtained which defines a system that will be solved using the Finite Element Method. The escaping of the secondary electrons is modeled by applying a Robin boundary condition on the top surface of the sample. By computing the secondary electron emission that originates from the sample during the beam scan, a synthetic SEM image is created.

Conference Presentation

Citation Download Citation

Duy Duc Nguyen, Jean-Herve Tortai, and Patrick Schiavone "FEM simulation for artificial generation of SEM pictures", Proc. SPIE 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII, 1095918 (26 March 2019); https://doi.org/10.1117/12.2515181

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